Semiconductor device

ABSTRACT

A programmable analog device and an analog device that can retain data even when supply of a power supply potential is interrupted and consumes less power. In a semiconductor device, first to fourth transistors are used as switches in a unit cell including an analog element, and the output of the unit cell switches between a conducting state, a non-conducting state, and a conducting state through the analog element by controlling the potential of a first node where the first transistor and the second transistor are connected and the potential of a second node where the third transistor and the fourth transistor are connected.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.13/481,148, filed May 25, 2012, now allowed, which claims the benefit ofa foreign priority application filed in Japan as Serial No. 2011-121559on May 31, 2011, both of which are incorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention disclosed in this specification relates to semiconductordevices.

Note that a semiconductor device in this specification and the likerefers to any device that can function by utilizing semiconductorcharacteristics, and semiconductor elements, electro-optical devices,storage devices, signal processing units, semiconductor circuits, andelectronic devices are all semiconductor devices.

2. Description of the Related Art

The configurations of semiconductor integrated circuits typified by LSIsare fixed at the time of manufacture and cannot be generally changedafter manufacture. In contrast, in semiconductor integrated circuitscalled programmable logic devices (PLDs), a logic block composed of aplurality of logic circuits is considered as a unit and logic blocks areelectrically connected to each other through wirings. In a programmablelogic device, the circuit configuration of each logic block can beelectrically controlled.

As above, the design of a programmable logic device can be changed aftermanufacture; thus, the use of a programmable logic device candrastically reduce the time and costs needed to design and developsemiconductor integrated circuits.

There are some programmable logic devices called complex PLD (CPLD) andfield programmable gate array (FPGA). In either device, the circuitconfiguration of each logic block is controlled by a programmable switchthat is switched in accordance with data (configuration data) stored ina memory unit provided in the logic block. In other words, programmingdata into each programmable switch makes it possible to change thecircuit configuration of a programmable logic device.

Volatile memory such as SRAM is used as the memory unit. On the otherhand, for example, Patent Document 1 discloses a technique for usingnonvolatile memory composed of a floating gate transistor, such as flashmemory, as the memory unit.

In addition, a programmable analog circuit having an array composed offunctional units including analog elements has been developed.

REFERENCE

Patent Document 1: Japanese Published Patent Application No. 2004-015060

SUMMARY OF THE INVENTION

Although a programmable circuit including an analog circuit (analogelement) is not as widely used as a programmable logic device includinga digital circuit, development of the programmable circuit is desired interms of lower cost, higher degree of design freedom, and the like ofthe circuit.

In recent years, the reduction in power consumption of electronicdevices has been an important issue, and lower power consumption ofsemiconductor integrated circuits used in electronic devices has alsobeen strongly required. In view of the above, in order to reduce powerconsumption, a driving method is proposed by which supply of a powersupply potential to the entire semiconductor device or part of thesemiconductor device is temporarily interrupted and supply of the powersupply potential is selected only when needed in a circuit unit thatneeds the supply.

When a memory unit in a programmable switch of a programmable logicdevice is made nonvolatile by using a floating gate transistor, datastored in a circuit unit is held even when supply of the power supplypotential is temporarily interrupted. However, since electrons areinjected into a floating gate to write data, a high potential isrequired, leading to the increase in power consumption. Moreover,tunneling current generated in data writing causes deterioration of agate insulating layer of a floating gate. Further, a floating gatetransistor has low data read/write speed and is thus unsuitable forintermittent operation.

In view of the above problems, an object of one embodiment of thepresent invention is to provide a programmable analog device. Anotherobject of one embodiment of the present invention is to provide ananalog device that can retain data even when supply of a power supplypotential is interrupted and consumes less power.

According to one embodiment of the disclosed invention, first to fourthtransistors are used as switches in a unit cell including an analogelement, and the output of the unit cell switches between a conductingstate, a non-conducting state, and a conducting state through the analogelement by controlling the potential of a first node where the firsttransistor and the second transistor are connected and the potential ofa second node where the third transistor and the fourth transistor areconnected. Specifically, any of the following structures can beemployed, for example.

According to one embodiment of the present invention, a semiconductordevice includes a programmable circuit including a unit cell, a bitline, a unit cell selection line, an analog element selection line, aninput signal line, and an output signal line. The unit cell includes afirst transistor, a second transistor, a third transistor, a fourthtransistor, and an analog element. The unit cell selection line and agate electrode of the first transistor are electrically connected toeach other. The bit line, one of a source electrode and a drainelectrode of the first transistor, and one of a source electrode and adrain electrode of the third transistor are electrically connected toeach other. The analog element selection line and a gate electrode ofthe third transistor are electrically connected to each other. The inputsignal line, one of a source electrode and a drain electrode of thesecond transistor, and one of electrodes of the analog element areelectrically connected to each other. The other of the electrodes of theanalog element and one of a source electrode and a drain electrode ofthe fourth transistor are electrically connected to each other. Theoutput signal line, the other of the source electrode and the drainelectrode of the second transistor, and the other of the sourceelectrode and the drain electrode of the fourth transistor areelectrically connected to each other. The other of the source electrodeand the drain electrode of the first transistor and a gate electrode ofthe second transistor are electrically connected to each other to form afirst node. The other of the source electrode and the drain electrode ofthe third transistor and a gate electrode of the fourth transistor areelectrically connected to each other to form a second node.

According to another embodiment of the present invention, asemiconductor device includes a programmable circuit including aplurality of unit cells arranged in a matrix, a plurality of bit lines,a plurality of unit cell selection lines, a plurality of analog elementselection lines, an input signal line, and an output signal line. One ofthe unit cells includes a first transistor, a second transistor, a thirdtransistor, a fourth transistor, and an analog element. One of the unitcell selection lines and a gate electrode of the first transistor areelectrically connected to each other. One of the bit lines, one of asource electrode and a drain electrode of the first transistor, and oneof a source electrode and a drain electrode of the third transistor areelectrically connected to each other. One of the analog elementselection lines and a gate electrode of the third transistor areelectrically connected to each other. The input signal line, one of asource electrode and a drain electrode of the second transistor, and oneof electrodes of the analog element are electrically connected to eachother. The other of the electrodes of the analog element and one of asource electrode and a drain electrode of the fourth transistor areelectrically connected to each other. The output signal line, the otherof the source electrode and the drain electrode of the secondtransistor, and the other of the source electrode and the drainelectrode of the fourth transistor are electrically connected to eachother. The other of the source electrode and the drain electrode of thefirst transistor and a gate electrode of the second transistor areelectrically connected to each other to form a first node. The other ofthe source electrode and the drain electrode of the third transistor anda gate electrode of the fourth transistor are electrically connected toeach other to form a second node. An analog value synthesized by theprogrammable circuit varies along with an output of each of the unitcells controlled in accordance with a potential of the first node and apotential of the second node.

In any one of the above semiconductor devices, at least one of the firsttransistor and the third transistor preferably includes a wide bandgapsemiconductor such as an oxide semiconductor.

Moreover, in any one of the above semiconductor devices, a resistor ispreferably used as the analog element.

The first to fourth transistors are provided in the unit cell includingthe analog element and the output of the unit cell is controlled by thepotentials supplied to the nodes of the transistors, whereby the outputof the unit cell can be switched simply and accurately. Further, when aplurality of unit cells are provided in the programmable circuit and theoutput of each unit cell is controlled, an analog value that can besynthesized by the programmable circuit can be variable; therefore, thecircuit can be optimized by adjusting the analog value. Thus, aversatile programmable circuit can be provided.

When transistors including a wide bandgap semiconductor (e.g., an oxidesemiconductor) with sufficiently low off-state current are used as thefirst and third transistors included in the unit cell, data forswitching the output of the unit cell can be held for a long time evenwhile supply of the power supply potential is interrupted. Consequently,power consumption of the semiconductor device can be reduced.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings:

FIG. 1 is a circuit diagram illustrating a semiconductor deviceaccording to one embodiment of the present invention;

FIGS. 2A to 2C are circuit diagrams illustrating a semiconductor deviceaccording to one embodiment of the present invention;

FIG. 3 is a circuit diagram illustrating a semiconductor deviceaccording to one embodiment of the present invention:

FIG. 4 is a circuit diagram illustrating a semiconductor deviceaccording to one embodiment of the present invention;

FIGS. 5A and 5B are circuit diagrams each illustrating a semiconductordevice according to one embodiment of the present invention;

FIGS. 6A to 6D illustrate steps of forming a programmable circuit;

FIGS. 7A and 7B illustrate steps of forming a programmable circuit,

FIGS. 8A to 8C illustrate steps of forming a programmable circuit;

FIGS. 9A and 9B illustrate steps of forming a programmable circuit;

FIG. 10 is a block diagram of a portable electronic device:

FIG. 11 is a block diagram of an e-book reader;

FIGS. 12A to 12E illustrate structures of an oxide material;

FIGS. 13A to 13C illustrate structures of an oxide material;

FIGS. 14A to 14C illustrate structures of an oxide material;

FIGS. 15A and 15B illustrate structures of oxide materials;

FIG. 16 is a graph showing gate voltage dependence of mobility obtainedby calculation;

FIGS. 17A to 17C are graphs showing gate voltage dependence of draincurrent and mobility obtained by calculation;

FIGS. 18A to 18C are graphs showing gate voltage dependence of draincurrent and mobility obtained by calculation;

FIGS. 19A to 19C are graphs showing gate voltage dependence of draincurrent and mobility obtained by calculation;

FIGS. 20A and 20B illustrate cross-sectional structures of transistorsused in calculation;

FIGS. 21A to 21C are graphs each showing characteristics of a transistorincluding an oxide semiconductor film;

FIG. 22 shows XRD spectra of Sample A and Sample B;

FIG. 23 is a graph showing a relation between off-state current of atransistor and substrate temperature in measurement;

FIG. 24 shows V_(g) dependence of I_(d) and field-effect mobility;

FIG. 25A shows a relation between threshold voltage and substratetemperature, and FIG. 25B shows a relation between field-effect mobilityand substrate temperature; and

FIGS. 26A and 26B are a plan view and a cross-sectional view of atransistor used for measurement.

DETAILED DESCRIPTION OF THE INVENTION

Embodiments of the present invention will be described below withreference to the accompanying drawings. Note that the present inventionis not limited to the following description, and it is easily understoodby those skilled in the art that the mode and details can be variouslychanged without departing from the spirit and scope of the presentinvention. Therefore, the present invention should not be limited to thedescriptions of the embodiments below.

Note that in this specification and the like, functions of the “source”and “drain” may be replaced with each other when a transistor ofopposite polarity is employed or when the direction of a current flowchanges in a circuit operation, for example. Therefore, the terms“source” and “drain” can be replaced with each other in thisspecification and the like.

In this specification and the like, the term “electrically connected”includes the case where components are connected through an objecthaving any electric function. There is no particular limitation on anobject having any electric function as long as electric signals can betransmitted and received between components that are connected throughthe object. Examples of an object having any electric function are aswitching element such as a transistor, a resistor, an inductor, acapacitor (also referred to as a condenser), and an element with avariety of functions as well as an electrode and a wiring.

The position, size, range, or the like of each component illustrated indrawings and the like is not accurately represented in some cases foreasy understanding. Therefore, the disclosed invention is notnecessarily limited to the position, size, range, or the like disclosedin the drawings and the like.

Note that the ordinal numbers such as “first” and “second” in thisspecification and the like are used for convenience and do not denotethe order of steps or the stacking order of layers. In addition, theordinal numbers in this specification and the like do not denoteparticular names that specify the present invention. Moreover, theseordinal numbers are used in order to avoid confusion among components,and the terms do not limit the components numerically.

Embodiment 1

In this embodiment, a circuit configuration of a semiconductor deviceaccording to one embodiment of the disclosed invention will be describedwith reference to FIG. 1 and FIGS. 2A to 2C.

<Basic Circuit>

FIG. 1 illustrates a configuration of a unit cell 320 included in aprogrammable circuit of this embodiment.

The unit cell 320 is electrically connected to a bit line B, a unit cellselection line S1, an analog element selection line S2, an input signalline IN, and an output signal line OUT.

The unit cell 320 includes a first transistor 340, a second transistor350, a third transistor 342, a fourth transistor 352, and an analogelement 310. In the unit cell 320 in FIG. 1, the unit cell selectionline S1 and a gate electrode of the first transistor 340 areelectrically connected to each other and the bit line B, one of a sourceelectrode and a drain electrode of the first transistor 340, and one ofa source electrode and a drain electrode of the third transistor 342 areelectrically connected to each other.

The analog element selection line S2 and a gate electrode of the thirdtransistor 342 are electrically connected to each other. A node I whereone of a source electrode and a drain electrode of the second transistor350 and one electrode of the analog element 310 are electricallyconnected to each other functions as an input terminal of the unit cell320. That is, the input signal line IN, one of the source electrode andthe drain electrode of the second transistor 350, and the one electrodeof the analog element 310 are electrically connected to each other. Theother electrode of the analog element 310 and one of a source electrodeand a drain electrode of the fourth transistor 352 are electricallyconnected to each other.

A node O where the other of the source electrode and the drain electrodeof the second transistor 350 and the other of the source electrode andthe drain electrode of the fourth transistor 352 are electricallyconnected to each other functions as an output terminal of the unit cell320. That is, the output signal line OUT, the other of the sourceelectrode and the drain electrode of the second transistor 350, and theother of the source electrode and the drain electrode of the fourthtransistor 352 are electrically connected to each other. The other ofthe source electrode and the drain electrode of the first transistor 340and a gate electrode of the second transistor 350 are electricallyconnected to each other, thereby forming a first node FG1. The other ofthe source electrode and the drain electrode of the third transistor 342and a gate electrode of the fourth transistor 352 are electricallyconnected to each other, thereby forming a second node FG2.

Examples of the analog element 310 applicable to the unit cell 320 are aresistor, a capacitor, a coil, and a photoelectric conversion element.

The output of the unit cell 320 can be controlled by the potentials ofthe first node FG1 and the second node FG2. For example, when thepotential of the first node FG1 is higher than or equal to the thresholdvoltage of the second transistor 350, the unit cell 320 is brought intoa conducting state regardless of the potential of the second node FG2 (afirst operation mode). When the potential of the first node FG1 is lowerthan the threshold voltage of the second transistor 350 and thepotential of the second node FG2 is lower than the threshold voltage ofthe fourth transistor 352, the unit cell 320 is brought into anon-conducting state (a second operation mode). When the potential ofthe first node FG1 is lower than the threshold voltage of the secondtransistor 350 and the potential of the second node FG2 is higher thanor equal to the threshold voltage of the fourth transistor 352, the unitcell 320 is brought into a conducting state through the analog element310, that is, a state in which electrical continuity is establishedthrough the analog element 310 (a third operation mode).

As described above, the first to fourth transistors are provided in theunit cell 320 and the output of the unit cell 320 is controlled by thepotentials supplied to the nodes of the transistors, whereby the outputof the unit cell 320 can be switched simply and accurately.

Note that one of the source electrode and the drain electrode of thefirst transistor 340 is electrically connected to the gate electrode ofthe second transistor 350, and thus has a function equivalent to afloating gate of a floating gate transistor used as a nonvolatile memoryelement. Moreover, one of the source electrode and the drain electrodeof the third transistor 342 is electrically connected to the gateelectrode of the fourth transistor 352, and thus has a functionequivalent to a floating gate. It can be considered that the first nodeFG1 or the second node FG2 is buried in an insulator when the firsttransistor 340 or the third transistor 342 is off, and charge is held inthe node.

Here, preferably at least one of the first transistor 340 and the thirdtransistor 342 is a transistor with extremely low off-state current, andfurther preferably both the first transistor 340 and the thirdtransistor 342 are transistors with extremely low off-state current. Anexample of such a transistor is a transistor including a wide bandgapsemiconductor material such as an oxide semiconductor. When a transistorwith extremely low off-state current is used as the first transistor340, the loss of charge stored in the first node FG1 due to leakage ofthe first transistor 340 can be ignored. In other words, the use of atransistor including an oxide semiconductor or the like makes itpossible to hold the potential of the first node FG1 for an extremelylong time even when power is not supplied. Similarly, when a transistorwith extremely low off-state current is used as the third transistor342, turning off the third transistor 342 makes it possible to hold thepotential of the second node FG2 for an extremely long time.

Note that there is no particular limitation on a semiconductor materialfor the second transistor 350 and the fourth transistor 352. In terms ofincreasing the output speed of the potential of the analog element 310,it is preferable to use a transistor with high switching rate, forexample, a transistor including single crystal silicon. Alternatively,like the first transistor 340 and the like, the second transistor 350 orthe fourth transistor 352 may include a wide bandgap semiconductor suchas an oxide semiconductor.

In this embodiment, a transistor including an oxide semiconductor isused as the first transistor 340 and the third transistor 342. Note thatin circuit diagrams, “OS” is sometimes written beside a transistor inorder to indicate that the transistor includes an oxide semiconductor.

The operation of the unit cell 320 will be described below withreference to FIGS. 2A to 2C. The case where the second transistor 350and the fourth transistor 352 are n-channel transistors is described asan example; however, this embodiment is not limited to this. In FIGS. 2Ato 2C, transistors indicated by solid lines mean the transistors areconducting (on), and transistors indicated by dashed lines mean thetransistors are not conducting (off).

To start with, the first operation mode will be described with referenceto FIG. 2A. First, the potential of the unit cell selection line S1 isset at a potential with which the first transistor 340 is turned on, sothat the first transistor 340 is turned on. Thus, the potential of thebit line B is applied to the first node FG1. That is, predeterminedcharge is applied to the gate electrode of the second transistor 350.Here, the bit line B has a high potential, and the first node FG1 issupplied with a potential higher than or equal to the threshold voltageof the second transistor 350. Then, the potential of the unit cellselection line S1 is set at a potential with which the first transistor340 is turned off.

Next, the potential of the analog element selection line S2 is set at apotential with which the third transistor 342 is turned on, so that thethird transistor 342 is turned on. Thus, the potential of the bit line Bis applied to the second node FG2. The fourth transistor 352 is off inFIG. 2A; however, this embodiment is not limited thereto. In the firstoperation mode, the fourth transistor 352 can be either on or off;consequently, the potential of the bit line B may be a high potential ora low potential (e.g., GND). Then, the potential of the analog elementselection line S2 is set at a potential with which the third transistor342 is turned off.

Next, a potential is supplied to the unit cell 320 from the input signalline IN. Since the potential applied to the first node FG1 is higherthan or equal to the threshold voltage of the second transistor 350 inthe first operation mode, the second transistor 350 is turned on, theunit cell 320 is brought into a conducting state, and the potentialsupplied to the input signal line IN is output to the output signal lineOUT.

When the potential supplied to the input signal line IN is output to theoutput signal line OUT by turning on the second transistor 350, apotential that is higher than the maximum potential applied to thesource electrode or the drain electrode of the second transistor 350 bythe threshold voltage of the second transistor 350 is supplied to thefirst node FG1 so that the potential to be output is not decreased bythe threshold voltage of the second transistor 350. Alternatively, atransmission gate and an inverter may be provided instead of the secondtransistor 350.

Next, the second operation mode will be described with reference to FIG.2B. First, the potential of the unit cell selection line S1 is set at apotential with which the first transistor 340 is turned on, so that thefirst transistor 340 is turned on. In the second operation mode, the bitline B has a low potential, and the first node FG1 is supplied with apotential lower than the threshold voltage of the second transistor 350.Then, the potential of the unit cell selection line S1 is set at apotential with which the first transistor 340 is turned off.

Next, the potential of the analog element selection line S2 is set at apotential with which the third transistor 342 is turned on, so that thethird transistor 342 is turned on. Here, the bit line B has a lowpotential, and the second node FG2 is supplied with a potential lowerthan the threshold voltage of the fourth transistor 352. Then, thepotential of the analog element selection line S2 is set at a potentialwith which the third transistor 342 is turned off.

Next, a potential is supplied to the unit cell 320 from the input signalline IN. In the second operation mode, the potential applied to thefirst node FG1 is lower than the threshold voltage of the secondtransistor 350 and the potential applied to the second node FG2 is lowerthan the threshold voltage of the fourth transistor 352; thus, the unitcell 320 is brought into a non-conducting state.

Next, the third operation mode will be described with reference to FIG.2C. First, the potential of the unit cell selection line S1 is set at apotential with which the first transistor 340 is turned on, so that thefirst transistor 340 is turned on. In the third operation mode, the bitline B has a low potential and the first node FG1 is supplied with apotential lower than the threshold voltage of the second transistor 350as in the second operation mode. Then, the potential of the unit cellselection line S1 is set at a potential with which the first transistor340 is turned off.

Next, the potential of the analog element selection line S2 is set at apotential with which the third transistor 342 is turned on, so that thethird transistor 342 is turned on. Here, the bit line B has a highpotential, and the second node FG2 is supplied with a potential higherthan or equal to the threshold voltage of the fourth transistor 352.Then, the potential of the analog element selection line S2 is set at apotential with which the third transistor 342 is turned off.

Subsequently, a potential is supplied to the unit cell 320 from theinput signal line IN. In the third operation mode, the potential appliedto the first node FG1 is lower than the threshold voltage of the secondtransistor 350 and the potential applied to the second node FG2 ishigher than or equal to the threshold voltage of the fourth transistor352; thus, the unit cell 320 is brought into a conducting state throughthe analog element 310 and the potential passing through the analogelement 310 is output to the output signal line OUT.

When the potential supplied to the input signal line IN is output to theoutput signal line OUT through the analog element 310 by turning on thefourth transistor 352, a potential that is higher than the maximumpotential applied to the source electrode or the drain electrode of thefourth transistor 352 by the threshold voltage of the fourth transistor352 is applied to the second node FG2 so that the potential to be outputis not decreased by the threshold voltage of the fourth transistor 352.Alternatively, a transmission gate and an inverter may be providedinstead of the fourth transistor 352.

As described above, the first to fourth transistors are used for theswitches in the unit cell 320, and the output of the unit cell canswitch between a conducting state, a non-conducting state, and aconducting state through the analog element 310 by controlling thepotential of the first node FG1 where the first transistor 340 and thesecond transistor 350 are connected and the potential of the second nodeFG2 where the third transistor 342 and the fourth transistor 352 areconnected.

In the first to third operation modes illustrated in FIGS. 2A to 2C,after the potential of the bit line B is stored in the first node FG1,when the potential of the unit cell selection line S1 is set at apotential with which the first transistor 340 is turned off to turn offthe first transistor 340 while the potential of the bit line B ismaintained, the potential applied to the first node FG1 can be heldwithout supplying a new potential. Similarly, after the potential of thebit line B is stored in the second node FG2, when the potential of theanalog element selection line S2 is set at a potential with which thethird transistor 342 is turned off to turn off the third transistor 342while the potential of the bit line B is maintained, the potentialapplied to the second node FG2 can be held without supplying a newpotential.

In this embodiment, since the first transistor 340 and the thirdtransistor 342 are formed using a wide bandgap semiconductor such as anoxide semiconductor and thus have extremely low off-state current, apredetermined potential applied to the first node FG1 and the secondnode FG2 is held for an extremely long time. Accordingly, a potentialfor switching the output of the unit cell 320 can be held without supplyof the power supply potential. As a result, supply of the power supplypotential to part of or the entire programmable circuit can betemporarily interrupted and the power supply potential can be suppliedonly when needed, so that power consumption can be reduced.

<Programmable Circuit 1>

A circuit configuration to which the unit cell in FIG. 1 is applied willbe described with reference to FIG. 3. A semiconductor deviceillustrated in FIG. 3 is a programmable circuit 330 including (m×n) unitcells that are arranged in a matrix and are connected between the inputsignal line IN and the output signal line OUT. Note that in thefollowing description, wirings having a similar function aredistinguished by “_(—)1”, “_(—)2”, “_n”, and the like added to the endof their names.

The semiconductor device in FIG. 3 includes m unit cell selection linesS1 (m: an integer of 2 or more), m analog element selection lines S2, nbit lines B (n: an integer of 2 or more), the input signal line IN, theoutput signal line OUT, and a unit cell array in which the unit cells320 are arranged in a matrix of m (rows) and n (columns).

The configuration of the unit cells 3210 included in the programmablecircuit 330 in FIG. 3 is similar to that in FIG. 1; the output of eachof the unit cells 320 (a conducting state, a non-conducting state, or aconducting state through the analog element) can be controlled by thepotentials applied to the first node FG1 and the second node FG2 in theunit cells 320.

In FIG. 3, an input terminal I of the unit cell 320 corresponds to thenode I in FIG. 1, where one of the source electrode and the drainelectrode of the second transistor 350 and one electrode of the analogelement 310 are connected to each other, and an output terminal O of theunit cell 320 corresponds to the node O in FIG. 1, where the other ofthe source electrode and the drain electrode of the second transistor350 and the other of the source electrode and the drain electrode of thefourth transistor 352 are connected to each other.

An analog value output from the output signal line OUT is synthesized bythe plurality of unit cells 320 included in the programmable circuit330. Accordingly, by controlling the output from each of the unit cells320, an analog value synthesized by the programmable circuit 330 can bemade variable. As a result, the versatile programmable circuit 330 canbe configured.

Assumption is made that the unit cells 320 are connected in a matrix andthere are two kinds of outputs from the unit cell (a non-conductingstate and a conducting state through the analog element). For example,when outputs from all the unit cells in the k-th column (k: an integersatisfying 2≦k≦n) are output without passing through the analog elementsin a unit cell array in which the unit cells are arranged in a matrix ofm rows and n columns, all the unit cells in the k-th column need to bebrought into a non-conducting state. Therefore, the output signal lineOUT needs to be provided for every column in order to obtain an analogvalue output from the other columns. In contrast, the unit cell 320 inthis embodiment can be brought into a conducting state without using theanalog element, by switching the output of the unit cell 320 with theuse of the combination of the potentials of the first node FG1 and thesecond node FG2. Thus, a variety of combinations of outputs can beoutput without providing a plurality of output signal lines OUT, so thatthe size and cost of the semiconductor device can be reduced and theprogrammable circuit with higher versatility can be provided.

<Programmable Circuit 2>

A circuit configuration to which the unit cell in FIG. 1 is applied andwhich is different from that in FIG. 3 will be described with referenceto FIG. 4. A semiconductor device illustrated in FIG. 4 is aprogrammable circuit 332 including (2h×n) unit cells that are arrangedin a matrix and are connected between the input signal line IN and theoutput signal line OUT. Note that in the following description, wiringshaving a similar function are distinguished by “_(—)1”, “_(—)2”, “_n”,and the like added to the end of their names.

The semiconductor device in FIG. 4 includes 2h unit cell selection linesS1 (I: an integer of 1 or more), 2h analog element selection lines S2, nbit lines B (n: an integer of 2 or more), the input signal line IN, theoutput signal line OUT, and a unit cell array in which the unit cells320 are arranged in a matrix of 2h (rows) and n (columns). Although FIG.4 illustrates the unit cell array including the unit cells 320 ofeven-numbered rows, this embodiment is not limited thereto and the unitcell array may include the unit cells 320 of odd-numbered rows.

The configuration of the unit cells 320 included in the programmablecircuit 332 in FIG. 4 is similar to that in FIG. 1: the output of eachof the unit cells 320 (a conducting state, a non-conducting state, or aconducting state through the analog element) can be controlled by thepotentials applied to the first node FG1 and the second node FG2 in theunit cells 320.

As in the programmable circuit 330 in FIG. 3, the unit cell array in theprogrammable circuit 332 in FIG. 4 is configured in the followingmanner: the unit cells 320 of n columns (the unit cells in one column iselectrically connected to a common bit line B) are connected in parallelto each other, and the unit cells in the h-th row which are electricallyconnected to a common unit cell selection line S1 and a common analogelement selection line S2 are connected in series with each other. Thedifference between the programmable circuit 330 and the programmablecircuit 332 is a way of connecting the output terminal (or the inputterminal) of one unit cell 320 and the input terminal (or the outputterminal) of another unit cell adjacent to the unit cell 320.

In the programmable circuit 330, the input terminal of the unit cell 320in the p-th row (p: an integer satisfying 2≦p≦n) and the k-th column iselectrically connected to the output terminal of the unit cell 320 inthe p-th row and the (k−1)th column, and the output terminal thereof iselectrically connected to the input terminal of the unit cell 320 in thep-th row and the (k+1)th column. Consequently, the potential suppliedfrom the input signal line IN is supplied to m unit cells 320 connectedin series in the first column, and then transferred to every row.

On the other hand, in the programmable circuit 332 in FIG. 4, the inputterminal of the unit cell 320 in the (2q+1)th row (q: an integersatisfying 1≦q≦h) and the k-th column is electrically connected to theoutput terminal of the unit cell 320 in the (2q+1)th row and the (k−1)thcolumn, the output terminal of the unit cell 320 in the 2q-th row andthe (k−1)th column, and the input terminal of the unit cell 320 in the(2q+2)th row and the (k−1)th column. The output terminal of the unitcell 320 in the (2q+1)th row and the k-th column is electricallyconnected to the input terminal of the unit cell 320 in the (2q+1)th rowand the (k+1)th column, the output terminal of the unit cell 320 in the2q-th row and the k-th column, and the input terminal of the unit cell320 in the (2q+2th row and the k-th column.

As a result, the potential supplied from the input signal line IN issupplied to unit cells 320 of odd-numbered rows among h unit cells 320connected in series in the first column, and then transferred in the rowdirection and the column direction.

When the input terminal (or the output terminal) of the unit cell 320 iselectrically connected to the output terminals (or the input terminals)of the unit cells 320 adjacent to the unit cell 320 in the row directionand the column direction as illustrated in FIG. 4, a more complicatedconfiguration of a programmable circuit and more complicated connectionbetween the unit cells can be easily achieved.

As described above, the programmable circuit in this embodiment includesa plurality of unit cells 320 each including the first to fourthtransistors as the switches, and the output of each unit cell 320 canswitch between a conducting state, a non-conducting state, and aconducting state through the analog element 310 by controlling thepotential of the first node FG1 (where the first transistor 340 and thesecond transistor 350 are connected) and the potential of the secondnode FG2 (where the third transistor 342 and the fourth transistor 352are connected). Thus, an analog value synthesized by the programmablecircuit can be varied along with the outputs of the unit cells, and thecircuit can be optimized by adjusting the analog value. A versatileprogrammable circuit can be provided as a result.

With the use of transistors including a wide bandgap semiconductor(e.g., an oxide semiconductor) with sufficiently low off-state currentas the first transistor 340 and the third transistor 342 included in theunit cell 320, data for switching the output of the unit cell 320 can beheld for a long time even while supply of the power supply potential isinterrupted. Consequently, power consumption can be reduced. Inaddition, since data for switching the output of the unit cell 320 isheld, the data does not need to be rewritten when the power supplypotential is supplied again; therefore, the start time of theprogrammable circuit after power on can be shortened as compared to thecase of using volatile memory.

Further, unlike the case where a floating gate is used in memory unitand data is written with electron injection, high voltage for injectingcharge is not necessary because the unit cell 320 included in theprogrammable circuit in this embodiment is controlled by switching ofthe transistor 340 including a wide bandgap semiconductor such as anoxide semiconductor. Moreover, a gate insulating layer is notdeteriorated by tunneling current, which is generated when electrons areinjected into a floating gate; therefore, the data rewrite cycles can beincreased.

The configurations, methods, and the like described in this embodimentcan be combined as appropriate with any of the configurations, methods,and the like described in the other embodiments.

Embodiment 2

In this embodiment, an application example of the programmable circuit332 in Embodiment 1 will be described. Needless to say, an analogelement described in this embodiment can be applied to the programmablecircuit 330. Further, an analog element other than that described inthis embodiment can be applied to the programmable circuit according toone embodiment of the present invention.

FIG. 5A illustrates an example where the programmable circuit 332 inFIG. 4 is applied to a ladder resistor circuit. A programmable circuit334 illustrated in FIG. 5A includes a resistor 312 as the analog element310 included in the unit cell 320.

In the programmable circuit 334 in FIG. 5A, the output of the unit cellcan switch between a conducting state, a non-conducting state, and aconducting state through the resistor 312 by controlling the potentialof the first node FG1 (where the first transistor 340 and the secondtransistor 350 are connected) and the potential of the second node FG2(where the third transistor 342 and the fourth transistor 352 areconnected) in the unit cell 320. Thus, the circuit can be optimized byadjusting the resistance value. Note that the number of the unit cells320 included in the programmable circuit 334 is preferably largerbecause the larger the number of the unit cells 320, the more variousthe resistance values that the programmable circuit can synthesize.

The programmable circuit 334 can be used as part of a D/A converter 380as illustrated in FIG. 5B, for example. With the use of the programmablecircuit 334 as part of the D/A converter 380, fine adjustment of theresistance value of the D/A converter 380 can be performed in aprogrammable way. As a result, the versatility of a semiconductor deviceincluding the D/A converter 380 can be increased.

In the D/A converter 380 described in this embodiment, a resistancevalue output from the programmable circuit 334 can be changed byswitching of the output from the unit cell 320, so that the resolutionof the D/A converter 380 can be changed easily and accurately. Further,the increase in the number of the unit cells 320 included in theprogrammable circuit 334 can increase the number of bits, so that theresolution of the D/A converter 380 can be increased. Thus, thesemiconductor device including the D/A converter 380 can besophisticated.

With the use of transistors including a wide bandgap semiconductor(e.g., an oxide semiconductor) with sufficiently low off-state currentas the first transistor 340 and the third transistor 342 included in theunit cell 320, data for switching the output of the unit cell 320 can beheld for a long time even while supply of the power supply potential isinterrupted. Consequently, power consumption of the semiconductor devicecan be reduced.

In addition, the resistor included in the programmable circuit 334preferably includes a semiconductor material similar to that used forthe first transistor 340 and the like (e.g., an oxide semiconductor), inwhich case the process of manufacturing the programmable circuit 334 canbe simplified and the manufacturing time can be shortened. Thus, thecosts for manufacturing the semiconductor device can be reduced.Further, semiconductor materials included in the first to fourthtransistors and the resistor may be the same.

The configurations, methods, and the like described in this embodimentcan be combined as appropriate with any of the configurations, methods,and the like described in the other embodiments.

Embodiment 3

In this embodiment, a method for manufacturing transistors included inthe programmable circuit in Embodiment 1 or Embodiment 2 will bedescribed with reference to FIGS. 6A to 6D, FIGS. 7A and 7B, FIGS. 8A to8C, and FIGS. 9A and 9B. In this embodiment, a method for manufacturinga transistor 110 including an oxide semiconductor (hereinafter alsoreferred to as an oxide semiconductor transistor) and an n-channeltransistor 112 is specifically described as an example. Note that theoxide semiconductor transistor 110 corresponds to the first transistor340 in FIG. 1, and the n-channel transistor 112 corresponds to thesecond transistor 350 in FIG. 1. In FIGS. 6A to 6D, FIGS. 7A and 713,FIGS. 8A to 8C, and FIGS. 9A and 9B, the cross section along A-B is across-sectional view of a region where the oxide semiconductortransistor 110 and the n-channel transistor 112 are formed, and thecross section along C-D is a cross-sectional view of a node FG where oneof a source electrode and a drain electrode of the oxide semiconductortransistor 110 and a gate electrode of the n-channel transistor 112 areconnected to each other.

First, as illustrated in FIG. 6A, element isolation regions 203 areformed in a p-type semiconductor substrate 201.

Examples of the p-type semiconductor substrate 201 are a single crystalsilicon substrate (a silicon wafer) having p-type conductivity and acompound semiconductor substrate (e.g., a SiC substrate, a sapphiresubstrate, and a GaN substrate).

Instead of the p-type semiconductor substrate 201, the following SOI(silicon on insulator) substrate may be used: an SIMOX (separation byimplanted oxygen) substrate which is formed in such a manner that oxygenions are implanted into a mirror-polished wafer, and thenhigh-temperature heating is performed to form an oxide layer at acertain depth from the surface and to eliminate defects generated in asurface layer; an SOI substrate formed by a Smart-Cut method in which asemiconductor substrate is cleaved by utilizing growth of minute voids,which are formed by implantation of hydrogen ions, by thermal treatment;or an SOI substrate formed by an ELTRAN (epitaxial layer transfer: aregistered trademark of Canon Inc.) method or the like.

The element isolation regions 203 are formed by a LOCOS (local oxidationof silicon) method, an STI (shallow trench isolation) method, or thelike.

When a p-channel transistor is formed over the same substrate as theoxide semiconductor transistor 110 and the n-channel transistor 112, forexample, when a p-channel transistor and an inverter are formed over thesame substrate, an n-well region may be formed in part of the p-typesemiconductor substrate 201. The n-well region is formed by addition ofan impurity element imparting n-type conductivity, such as phosphorus orarsenic.

Although the p-type semiconductor substrate is used here, a p-channeltransistor may be formed using an n-type semiconductor substrate. Inthat case, a p-well region to which an impurity element imparting p-typeconductivity, such as boron, is added may be formed in the n-typesemiconductor substrate and an n-channel transistor may be formed overthe same substrate.

Next, as illustrated in FIG. 6B, a gate insulating film 207 and a gateelectrode 209 are formed over the semiconductor substrate 201.

Heat treatment is performed to oxidize a surface of the semiconductorsubstrate 201, thereby forming a silicon oxide film. Alternatively, astack of a silicon oxide film and a silicon film containing oxygen andnitrogen (silicon oxynitride film) may be formed in such a manner thatthe silicon oxide film is formed by thermal oxidation and thennitridation treatment is performed to nitride a surface of the siliconoxide film. Next, part of the silicon oxide film or part of the siliconoxynitride film is selectively etched, thereby forming the gateinsulating film 207. Alternatively, the gate insulating film 207 isformed in the following manner: a film with a thickness of 5 nm to 50 nmis formed by CVD, sputtering, or the like using silicon oxide, siliconoxynitride, or a high dielectric constant material (high-k material),for example, metal oxide such as tantalum oxide, hafnium oxide,zirconium oxide, aluminum oxide, or titanium oxide, rare earth oxidesuch as lanthanum oxide, or hafnium silicate and then part of the filmis selectively etched.

The gate electrode 209 is preferably formed using a metal such astantalum, tungsten, titanium, molybdenum, chromium, or niobium or analloy material or a compound material containing any of the metals asits main component. Further, polycrystalline silicon to which animpurity element such as phosphorus is added can be used. Alternatively,the gate electrode 209 may be a stack of a metal nitride film and a filmof any of the above metals. As metal nitride, tungsten nitride,molybdenum nitride, or titanium nitride can be used. The provision ofthe metal nitride film can increase the adhesiveness of the metal filmand thus can prevent the metal film from being separated from the gateinsulating film 207.

The gate electrode 209 is formed in such a manner that a conductive filmis formed by sputtering, CVD, or the like and then part of theconductive film is selectively etched.

Here, a silicon oxide film is formed by performing heat treatment tooxidize a surface of the semiconductor substrate 201, a conductive filmin which a tantalum nitride film and a tungsten film are stacked isformed over the silicon oxide film by sputtering, and then, part of thesilicon oxide film and part of the conductive film are selectivelyetched, thereby forming the gate insulating film 207 and the gateelectrode 209.

Note that in terms of higher integration, it is preferable that asidewall insulating layer be not provided on a side surface of the gateelectrode 209. On the other hand, a sidewall insulating layer can beprovided on a side surface of the gate electrode 209 if a priority isgiven to characteristics of a transistor.

Next, as illustrated in FIG. 6C, an impurity element imparting n-typeconductivity is added to the semiconductor substrate 201 to form n-typeimpurity regions 211 a and 211 b. In the case where an n-well region isformed in the semiconductor substrate 201, an impurity element impartingp-type conductivity is added to the n-well region to form p-typeimpurity regions. The concentration of the impurity element impartingn-type conductivity in the n-type impurity regions 211 a and 211 b andthe concentration of the impurity element imparting p-type conductivityin the p-type impurity regions range from 1×10¹⁹/cm³ to 1×10²¹/cm³. Theimpurity element imparting n-type conductivity and the impurity elementimparting p-type conductivity are added to the semiconductor substrate201 and the n-well region, respectively, by ion doping, ionimplantation, or the like as appropriate.

In the case where a sidewall insulating layer is provided on a sidesurface of the gate electrode 209, an impurity region having an impurityconcentration different from those of the n-type impurity regions 211 aand 211 b and the p-type impurity regions can be formed in a regionoverlapping with the sidewall insulating layer.

Next, as illustrated in FIG. 6D, an insulating film 215 and aninsulating film 217 are formed over the semiconductor substrate 201, theelement isolation regions 203, the gate insulating film 207, and thegate electrode 209 by sputtering. CVD, or the like.

The insulating films 215 and 217 are each formed with a single layer ora stack using one or more of silicon oxide, silicon oxynitride, siliconnitride oxide, silicon nitride, aluminum oxide, aluminum oxynitride,aluminum nitride oxide, aluminum nitride, and the like. When theinsulating film 215 is formed by CVD, a hydrogen content of theinsulating film 215 is increased. When such an insulating film 215 isused and heat treatment is performed, the semiconductor substrate ishydrogenated and dangling bonds are terminated by hydrogen, so thatdefects in the semiconductor substrate can be reduced.

The planarity of the insulating film 217 can be high when the insulatingfilm 217 is formed using an inorganic material such as boron phosphorussilicon glass (BPSG) or an organic material such as polyimide oracrylic.

After the insulating film 215 or the insulating film 217 is formed, heattreatment is performed in order to activate the impurity elements addedto the n-type impurity regions 211 a and 211 b and the p-type impurityregions.

Through the above-described steps, the n-channel transistor 112 can befabricated as illustrated in FIG. 6D.

Next, parts of the insulating films 215 and 217 are selectively etchedto form openings. Then, a contact plug 219 a and a contact plug 219 bare formed in the openings.

Typically, a conductive film is formed by sputtering, CVD, or the likeand then subjected to planarization treatment such as chemicalmechanical polishing (CMP) or etching so that an unnecessary portion ofa surface of the conductive film is removed, thereby forming the contactplugs.

The conductive film serving as the contact plugs 219 a and 219 b isformed by depositing tungsten silicide in the openings by CVD using aWF₆ gas and a SiH₄ gas.

Next, an insulating film is formed over the insulating film 217 and thecontact plugs 219 a and 219 b by sputtering, CVD, or the like, and afterthat, part of the insulating film is selectively etched to form aninsulating film 221 having a groove. Subsequently, a conductive film isformed by sputtering, CVD, or the like and then subjected toplanarization treatment such as CMP or etching so that an unnecessaryportion of a surface of the conductive film is removed, thereby forminga wiring 223 a and a wiring 223 b (see FIG. 7A).

Here, the wirings 223 a and 223 b function as a source electrode and adrain electrode of the transistor 112. One of the wirings 223 a and 223b is electrically connected to one electrode of the analog element 310illustrated in FIG. 1, and the other thereof is electrically connectedto the output signal line OUT illustrated in FIG. 1.

The insulating film 221 can be formed using a material similar to thatfor the insulating film 215.

The wirings 223 a and 223 b are formed with a single layer or a stackcontaining a metal such as aluminum, titanium, chromium, nickel, copper,yttrium, zirconium, molybdenum, silver, tantalum, or tungsten or analloy containing any of these metals as a main component. For example,the wirings 223 a and 223 b have a single-layer structure of an aluminumfilm containing silicon, a two-layer structure in which a titanium filmis stacked over an aluminum film, a two-layer structure in which atitanium film is stacked over a tungsten film, a two-layer structure inwhich a copper film is formed over a copper-magnesium-aluminum alloyfilm, or a three-layer structure in which a titanium film, an aluminumfilm, and a titanium film are stacked in this order. Note that atransparent conductive material containing indium oxide, tin oxide, orzinc oxide may be used.

With the use of the planarized insulating film 221 and wirings 223 a and223 b, variations in electric characteristics of oxide semiconductortransistors to be fabricated later can be reduced, and the oxidesemiconductor transistors can be fabricated at high yield.

Then, hydrogen contained in the insulating film 221 and the wirings 223a and 223 b is preferably eliminated by heat treatment or plasmatreatment. Consequently, in heat treatment performed later, diffusion ofhydrogen into an insulating film and an oxide semiconductor film whichare formed later can be prevented. The heat treatment is performed at atemperature higher than or equal to 100° C. and lower than the strainpoint of the substrate in an inert atmosphere, a reduced-pressureatmosphere, or a dry air atmosphere. Further, for the plasma treatment,a rare gas, oxygen, nitrogen, or nitrogen oxide (e.g., nitrous oxide,nitrogen monoxide, or nitrogen dioxide) is used.

Next, an insulating film 225 is formed over the insulating film 221 andthe wirings 223 a and 223 b by sputtering, CVD, or the like. Theinsulating film 225 is formed with a single layer or a stack containingsilicon oxide, silicon oxynitride, silicon nitride oxide, gallium oxide,hafnium oxide, yttrium oxide, aluminum oxide, and/or aluminumoxynitride. Moreover, the insulating film 225 is preferably formed usingan oxide insulating film from which some contained oxygen is released byheating. The oxide insulating film from which some contained oxygen isreleased by heating is an oxide insulating film that contains oxygen ata proportion exceeding the stoichiometric proportion. Since oxygen isreleased from such an oxide insulating film by heating, oxygen can bediffused into the oxide semiconductor film by heat treatment performedlater.

The insulating film 225 is preferably planarized by CMP treatment or thelike. The average surface roughness (R_(a)) of a surface of theinsulating film 225 is 1 nm or less, preferably 0.3 nm or less, furtherpreferably 0.1 nm or less.

In this specification and the like, the average surface roughness(R_(a)) is obtained by three-dimension expansion of center line averagesurface roughness (R_(a)) which is defined by JISB0601:2001 (ISO4287:1997) so that R_(a) can be applied to a measurement surface, and isan average value of the absolute values of deviations from a referencesurface to a specific surface.

When the measurement surface which is a surface represented bymeasurement data is expressed by Z═F(X,Y), the average surface roughness(R_(a)) is an average value of the absolute values of deviations fromthe reference surface to the specific surface and is expressed byFormula 1.

$\begin{matrix}{R_{a} = {\frac{1}{S_{0}}{\int_{Y_{1}}^{y_{2}}{\int_{X_{1}}^{X_{2}}{{{{F\left( {X,Y} \right)} - Z_{0}}}{X}{Y}}}}}} & \left\lbrack {{Formula}\mspace{14mu} 1} \right\rbrack\end{matrix}$

Here, the specific surface is a surface which is a target of roughnessmeasurement, and is a quadrangular region represented by four points(X₁,Y₁), (X₁,Y₂), (X₂,Y₁), and (X₂, Y₂). Moreover, S₀ represents thearea of the specific surface when the specific surface is flat ideally.The reference surface refers to a surface parallel to an X—Y surface atthe average height of the specific surface. That is, when the averagevalue of the height of the specific surface is denoted by Z₀, the heightof the reference surface is also denoted by Z₀. The average surfaceroughness (R_(a)) can be measured using an atomic force microscope(AFM).

The CMP treatment may be performed once or plural times. When the CMPtreatment is performed plural times, first polishing is preferablyperformed with a high polishing rate followed by final polishing with alow polishing rate. By performing polishing steps with differentpolishing rates in combination, the flatness of the surface of theinsulating film 225 can be further increased.

Alternatively, the insulating film 225 can be planarized by plasmatreatment. The plasma treatment is performed in such a manner that aninert gas, for example, a rare gas such as an argon gas is introducedinto a vacuum chamber and an electric field is applied so that a surfaceto be processed serves as a cathode. The plasma treatment has the sameprinciple as a plasma dry etching method, except that an inert gas isused in the plasma treatment. In other words, in the plasma treatment,the surface to be processed is irradiated with ions of an inert gas andminute unevenness of the surface is reduced by a sputtering effect.Accordingly, the plasma treatment can be called reverse sputteringtreatment.

When the plasma treatment is performed, electrons and argon cations arepresent in plasma and the argon cations are accelerated in the cathodedirection. The surface to be processed is sputtered by the acceleratedargon cations. At that time, a projected portion of the surface ispreferentially sputtered. Particles ejected from the surface attach toanother place of the surface. At that time, the particles ejected fromthe surface preferentially attach to a recessed portion of the surface.By thus reducing the projected portion and filling the recessed portion,the planarity of the surface is increased. Note that the use of theplasma treatment and the CMP treatment in combination can furtherincrease the planarity of the insulating film 225.

Note that through the plasma treatment, it is possible to removeimpurities, such as oxygen, moisture, and an organic compound, attachedonto the surface of the insulating film 225 by a sputtering effect.

Note that before the deposition of the oxide semiconductor film, it ispreferable that a deposition chamber be heated and evacuated to removeimpurities, such as hydrogen, water, a hydroxyl group, and hydride, inthe deposition chamber. It is particularly important to remove theimpurities absorbed on an inner wall of the deposition chamber. Here,heat treatment may be performed at 100° C. to 450° C., for example. Thedeposition chamber is preferably evacuated with a rough vacuum pump suchas a dry pump and a high vacuum pump such as a sputter ion pump, a turbomolecular pump, or a cryopump in appropriate combination. The turbomolecular pump has an outstanding capability of evacuating large-sizedmolecules, whereas it has a low capability of evacuating hydrogen orwater. Furthermore, it is effective to use a combination of the turbomolecular pump and a cryopump having a high capability of evacuatingwater or a sputter ion pump having a high capability of evacuatinghydrogen. At this time, when impurities are removed while an inert gasis introduced, the rate of elimination of water or the like, which isdifficult to eliminate only by evacuation, can be further increased. Byremoving impurities in the deposition chamber by such treatment beforethe deposition of the oxide semiconductor film, mixture of hydrogen,water, a hydroxyl group, hydride, and the like into the oxidesemiconductor can be reduced.

In addition, before the oxide semiconductor film is formed by asputtering apparatus, a dummy substrate may be put into the sputteringapparatus, and an oxide semiconductor film may be formed over the dummysubstrate to remove hydrogen and moisture attached to the target surfaceor a deposition shield.

Next, an oxide semiconductor film 227 is formed over the insulating film225 by sputtering, coating, printing, evaporation, PCVD, PLD, ALD, MBE,or the like (see FIG. 7B). Here, the oxide semiconductor film 227 isformed to a thickness of 1 nm to 50 nm, preferably 3 nm to 20 nm bysputtering. With the oxide semiconductor film 227 having a thickness inthe above range, a short-channel effect which might occur due tominiaturization of the transistor can be suppressed.

An oxide semiconductor used for the oxide semiconductor film 227preferably contains at least indium (In) or zinc (Zn). In particular,the oxide semiconductor preferably contains In and Zn. As a stabilizerfor reducing variations in electric characteristics of transistors usingthe oxide semiconductor, the oxide semiconductor preferably containsgallium (Ga), tin (Sn), hafnium (Hf), and/or aluminum (Al) in additionto In and Zn.

As another stabilizer, the oxide semiconductor may contain one or pluralkinds of lanthanoid such as lanthanum (La), cerium (Cc), praseodymium(Pr), neodymium (Nd), samarium (Sm), europium (Eu), gadolinium (Gd),terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm),ytterbium (Yb), and lutetium (Lu).

As the oxide semiconductor, any of the following oxides can be used, forexample: indium oxide; tin oxide; zinc oxide; two-component metal oxidesuch as In—Zn-based oxide, Sn—Zn-based oxide, Al—Zn-based oxide,Zn—Mg-based oxide. Sn—Mg-based oxide, In—Mg-based oxide, and In—Ga-basedoxide; three-component metal oxide such as In—Ga—Zn-based oxide (alsoreferred to as IGZO), In—Al—Zn-based oxide, In—Sn—Zn-based oxide,Sn—Ga—Zn-based oxide, Al—Ga—Zn-based oxide, Sn—Al—Zn-based oxide,In—Hf—Zn-based oxide, In—La—Zn-based oxide, In—Ce—Zn-based oxide,In—Pr—Zn-based oxide, In—Nd—Zn-based oxide, In—Sm—Zn-based oxide,In—Eu—Zn-based oxide. In—Gd—Zn-based oxide, In—Tb—Zn-based oxide,In—Dy—Zn-based oxide, In—Ho—Zn-based oxide, In—Er—Zn-based oxide,In—Tm—Zn-based oxide, In—Yb—Zn-based oxide, and In—Lu—Zn-based oxide;and four-component metal oxide such as In—Sn—Ga—Zn-based oxide,In—Hf—Ga—Zn-based oxide, In—Al—Ga—Zn-based oxide, In—Sn—Al—Zn-basedoxide, In—Sn—Hf—Zn-based oxide, and In—Hf—Al—Zn-based oxide. Moreover,silicon oxide may be included in the above oxide semiconductor. Here,for example, an In—Ga—Zn-based oxide means an oxide containing indium(In), gallium (Ga), and zinc (Zn) as its main components and there is noparticular limitation on the composition ratio. The In—Ga—Zn-based oxidemay contain a metal element other than In, Ga, and Zn. Here, the amountof oxygen in the above oxide semiconductor preferably exceeds thestoichiometric proportion of oxygen. When the amount of oxygen exceedsthe stoichiometric proportion, generation of carriers which results fromoxygen vacancies in the oxide semiconductor film can be suppressed.

Alternatively, a material represented by InMO₃(ZnO)_(m) (m>0 and m isnot an integer) may be used as the oxide semiconductor. Note that Mrepresents one or more metal elements selected from Ga, Fe, Mn, and Co.Alternatively, as the oxide semiconductor, a material expressed byIn₃SnOs(ZnO)_(n) (n>0 and n is an integer) may be used.

The concentration of alkali metals or alkaline earth metals in the oxidesemiconductor film 227 is preferably lower than or equal to 1×10¹⁸atoms/cm³, further preferably lower than or equal to 2×10¹⁶ atoms/cm³.This is because carriers might be generated when an alkali metal or analkaline earth metal is bonded to an oxide semiconductor, which causesan increase in the off-state current of the transistor.

The oxide semiconductor film 227 may contain nitrogen at a concentrationof 5×10¹⁸ atoms/cm³ or lower.

The oxide semiconductor that can be used for the oxide semiconductorfilm 227 is a wide bandgap semiconductor, which has a wider bandgap anda lower intrinsic carrier density than a silicon semiconductor. Theoff-state current of the transistor can be reduced by using an oxidesemiconductor with a wide energy gap.

The oxide semiconductor film 227 may have a single crystal structure ora non-single-crystal structure. In the latter case, the oxidesemiconductor film 227 may have an amorphous structure or apolycrystalline structure. Further, the oxide semiconductor film 227 mayhave an amorphous structure including a portion having crystallinity ora non-amorphous structure.

An oxide semiconductor in an amorphous state can have a flat surfacewith relative ease; thus, when a transistor is fabricated using theoxide semiconductor, interface scattering can be reduced and relativelyhigh mobility can be obtained with relative ease.

In an oxide semiconductor having crystallinity, defects in the bulk canbe further reduced, and when the surface flatness is increased, mobilityhigher than that of an oxide semiconductor in an amorphous state can beobtained. In order to increase the surface flatness, the oxidesemiconductor is preferably formed on a flat surface. As describedabove, the oxide semiconductor film 227 is preferably formed over asurface of the insulating film 225 with the average surface roughness(R_(a)) of 1 nm or less, preferably 0.3 nm or less, further preferably0.1 nm or less.

Here, the oxide semiconductor film 227 is formed by sputtering.

As a sputtering target, any of the following oxides can be used, forexample: indium oxide: tin oxide; zinc oxide; two-component metal oxidesuch as In—Zn-based oxide, Sn—Zn-based oxide, Al—Zn-based oxide,Zn—Mg-based oxide, Sn—Mg-based oxide, In—Mg-based oxide, and In—Ga-basedoxide; three-component metal oxide such as In—Ga—Zn-based oxide (IGZO),In—Al—Zn-based oxide, In—Sn—Zn-based oxide, Sn—Ga—Zn-based oxide,Al—Ga—Zn-based oxide, Sn—Al—Zn-based oxide. In—Hf—Zn-based oxide,In—La—Zn-based oxide, In—Ce—Zn-based oxide, In—Pr—Zn-based oxide.In—Nd—Zn-based oxide, In—Sm—Zn-based oxide, In—Eu—Zn-based oxide,In—Gd—Zn-based oxide, In—Tb—Zn-based oxide, In—Dy—Zn-based oxide.In—Ho—Zn-based oxide, In—Er—Zn-based oxide, In—Tm—Zn-based oxide,In—Yb—Zn-based oxide, and In—Lu—Zn-based oxide; and four-component metaloxide such as In—Sn—Ga—Zn-based oxide, In—Hf—Ga—Zn-based oxide,In—Al—Ga—Zn-based oxide, In—Sn—Al—Zn-based oxide, In—Sn—Hf—Zn-basedoxide, and In—Hf—Al—Zn-based oxide.

When an In—Ga—Zn—O-based material is used as the oxide semiconductor,metal elements included in the target can have an atomic ratio ofIn:Ga:Zn=1:1:1, 4:2:3, 3:1:2, 1:1:2, 2:1:3, or 3:1:4, for example. AnIn—Ga—Zn-based oxide with such an atomic ratio or an oxide whosecomposition is in the neighborhood of the above compositions can be usedas the target. With the target with the above composition ratio, apolycrystalline film or a CAAC-OS film described later is likely to beformed.

When an In—Sn—Zn—O-based material is used as the oxide semiconductor,metal elements included in a target having an atomic ratio ofIn:Sn:Zn=1:1:1, 2:1:3, 1:2:2, or 20:45:35, for example, is used. AnIn—Sn—Zn-based oxide with such an atomic ratio or an oxide whosecomposition is in the neighborhood of the above compositions can be usedas the target. With the target with the above composition ratio, apolycrystalline film or a CAAC-OS film described later is likely to beformed.

When an In—Zn—O-based material is used as the oxide semiconductor, metalelements included in a target has an atomic ratio of In:Zn=50:1 to 1:2(In₂O₃:ZnO=25:1 to 1:4 in a molar ratio), preferably In:Zn=20:1 to 1:1(In₂O₃:ZnO=10:1 to 1:2 in a molar ratio), further preferably In:Zn=15:1to 1.5:1 (In₂O₃:ZnO=15:2 to 3:4 in a molar ratio). For example, in atarget used for forming an In—Zn-based oxide semiconductor that has anatomic ratio of In:Zn:O═X:Y:Z, the relation of Z>1.5X+Y is satisfied. AnIn—Zn-based oxide with such an atomic ratio or an oxide whosecomposition is in the neighborhood of the above compositions can be usedas the target.

However, without limitation to the materials given above, a materialwith an appropriate composition may be used depending on neededsemiconductor characteristics (e.g., mobility, threshold voltage, andvariation). In order to obtain the needed semiconductor characteristics,it is preferable that the carrier density, the impurity concentration,the defect density, the atomic ratio between a metal element and oxygen,the interatomic distance, the density, and the like be set toappropriate values.

For example, high mobility can be obtained relatively easily in the caseof using an In—Sn—Zn-based oxide. However, mobility can be increased byreducing the defect density in a bulk also in the case of using anIn—Ga—Zn-based oxide.

Note that for example, the expression “the composition of an oxidecontaining In, Ga, and Zn at the atomic ratio, In:Ga:Zn=a:b:c (a+b+c=1),is in the neighborhood of the composition of an oxide containing In, Ga,and Zn at the atomic ratio. In:Ga:Zn=A:B:C (A+B+C=1)” means that a, b,and c satisfy the following relation: (a−A)²+(b−B)²+(c−C)≦r², and r maybe 0.05, for example. The same applies to other oxides.

As a sputtering gas, a rare gas (typically argon) atmosphere, an oxygenatmosphere, or a mixed gas of a rare gas and oxygen is used asappropriate. In the case of using the mixed gas of a rare gas andoxygen, the proportion of oxygen is preferably higher than that of therare gas. Further, in order to prevent hydrogen, water, a hydroxylgroup, hydride, and the like from entering the oxide semiconductor film,the sputtering gas is preferably an atmosphere of a high-purity gas fromwhich impurities such as hydrogen, water, a hydroxyl group, and hydrideare sufficiently removed.

For sputtering, an RF power supply device, an AC power supply device, aDC power supply device, or the like can be used as appropriate as apower supply device for generating plasma.

Note that the leakage rate of a treatment chamber in which the oxidesemiconductor film is formed is preferably lower than or equal to1×10⁻¹⁰ Pa·m³/s, whereby entry of impurities into the film to be formedby sputtering can be decreased. As described above, in the process offorming the oxide semiconductor film and preferably in the process offorming the oxide insulating film, entry of impurities is suppressed asmuch as possible through control of the pressure of the treatmentchamber, the leakage rate of the treatment chamber, and the like,whereby entry of impurities such as hydrogen into the oxidesemiconductor film can be reduced. In addition, diffusion of impuritiessuch as hydrogen from the oxide insulating film to the oxidesemiconductor film can be reduced.

As the oxide semiconductor film 227, a c-axis aligned crystalline oxidesemiconductor (CAAC-OS) film including crystallized parts may be used.

The CAAC-OS film is not completely single crystal nor completelyamorphous. The CAAC-OS film is an oxide semiconductor film with acrystal-amorphous mixed phase structure where crystalline parts andamorphous parts are included in an amorphous phase. Note that in mostcases, the crystal part fits inside a cube whose one side is less than100 nm. From an observation image obtained with a transmission electronmicroscope (TEM), a boundary between an amorphous part and a crystalpart in the CAAC-OS film is not clear. Further, a grain boundary in theCAAC-OS film is not found with the TEM. Thus, a reduction in electronmobility due to the grain boundary is suppressed in the CAAC-OS film.

In each of the crystal parts included in the CAAC-OS film, the c-axis isaligned in a direction parallel to a normal vector of a surface wherethe CAAC-OS film is formed or a normal vector of a surface of theCAAC-OS film, triangular or hexagonal atomic arrangement which is seenfrom the direction perpendicular to the a-b plane is formed, and metalatoms are arranged in a layered manner or metal atoms and oxygen atomsare arranged in a layered manner when seen from the directionperpendicular to the c-axis. Note that among crystal parts, thedirections of the a-axis and the b-axis of one crystal part may bedifferent from those of another crystal part. In this specification, asimple term “perpendicular” includes a range from 150 to 95“. Inaddition, a simple term “parallel” includes a range from −5° to 5°.

In the CAAC-OS film, distribution of crystal parts is not necessarilyuniform. For example, when crystal growth occurs from a surface side ofthe oxide semiconductor film in the process of forming the CAAC-OS film,the proportion of crystal parts in the vicinity of the surface of theoxide semiconductor film is sometimes higher than that in the vicinityof the surface where the oxide semiconductor film is formed. Further,when an impurity or the like is added to the CAAC-OS film, the crystalpart in a region to which the impurity is added becomes amorphous insome cases.

Since the c-axes of the crystal parts included in the CAAC-OS film arealigned in the direction parallel to a normal vector of the surfacewhere the CAAC-OS film is formed or a normal vector of the surface ofthe CAAC-OS film, the directions of the c-axes may be different fromeach other depending on the shape of the CAAC-OS film (thecross-sectional shape of the surface where the CAAC-OS film is formed orthe cross-sectional shape of the surface of the CAAC-OS film). Note thatthe direction of c-axis of the crystal part is the direction parallel toa normal vector of the surface where the CAAC-OS film is formed or anormal vector of the surface of the CAAC-OS film. The crystal part isformed by deposition or by performing treatment for crystallization suchas heat treatment after deposition.

With the use of the CAAC-OS film, the change in electric characteristicsof the transistor due to irradiation with visible light or ultravioletlight can be reduced. Accordingly, a highly reliable transistor can befabricated. Specifically, as described above, it is preferable that theaverage surface roughness (R_(a)) of the surface of the insulating film225 be 1 nm or less, preferably 0.3 nm or less, further preferably 0.1nm or less and an oxide semiconductor film including crystals whosec-axes are aligned be formed over the surface of the insulating film225. Thus, the crystallinity of the oxide semiconductor film includingthe crystals whose c-axes are aligned can be increased, and the mobilityof the transistor including the oxide semiconductor film can beincreased.

Examples of a crystal structure of the CAAC-OS film will be described indetail with reference to FIGS. 12A to 12E, FIGS. 13A to 13C, FIGS. 14Ato 14C, and FIGS. 15A and 15B. In FIGS. 12A to 12E, FIGS. 13A to 13C,FIGS. 14A to 14C, and FIGS. 15A and 1513, the vertical directioncorresponds to the c-axis direction and a plane perpendicular to thec-axis direction corresponds to the a-b plane, unless otherwisespecified. An “upper half” and a “lower half” refer to an upper halfabove the a-b plane and a lower half below the a-b plane (an upper halfand a lower half with respect to the a-b plane). Furthermore, in FIGS.12A to 12E, O surrounded by a circle represents tetracoordinate O and Osurrounded by a double circle represents tricoordinate O.

FIG. 12A illustrates a structure including one hexacoordinate in atomand six tetracoordinate oxygen (hereinafter referred to astetracoordinate O) atoms proximate to the In atom. Here, a structureincluding one metal atom and oxygen atoms proximate thereto is referredto as a small group. The structure in FIG. 12A is actually an octahedralstructure, but is illustrated as a planar structure for simplicity. Notethat three tetracoordinate O atoms exist in each of the upper half andthe lower half in FIG. 12A. The electric charge of the small group inFIG. 12A is 0.

FIG. 12B illustrates a structure including one pentacoordinate Ga atom,three tricoordinate oxygen (hereinalter referred to as tricoordinate O)atoms proximate to the Ga atom, and two tetracoordinate O atomsproximate to the Ga atom. All the tricoordinate O atoms exist on the a-bplane. One tetracoordinate O atom exists in each of the upper half andthe lower half in FIG. 12B. An In atom can also have the structureillustrated in FIG. 12B because an In atom can have five ligands. Theelectric charge of the small group in FIG. 12B is 0.

FIG. 12C illustrates a structure including one tetracoordinate Zn atomand four tetracoordinate O atoms proximate to the Zn atom. In FIG. 12C,one tetracoordinate O atom exists in the upper half and threetetracoordinate O atoms exist in the lower half. The electric charge ofthe small group in FIG. 12C is 0.

FIG. 12D illustrates a structure including one hexacoordinate Sn atomand six tetracoordinate O atoms proximate to the Sn atom. In FIG. 12D,three tetracoordinate O atoms exist in each of the upper half and thelower half. The electric charge of the small group in FIG. 12D is +1.

FIG. 12E illustrates a small group including two Zn atoms. In FIG. 12E,one tetracoordinate O atom exists in each of the upper half and thelower half. The electric charge of the small group in FIG. 12E is −1.

Here, a plurality of small groups form a medium group, and a pluralityof medium groups form a large group.

Now, a rule of bonding between the small groups will be described. Thethree O atoms in the upper half with respect to the In atom each havethree proximate In atoms in the downward direction, and the three Oatoms in the lower half each have three proximate In atoms in the upwarddirection. The one O atom in the upper half with respect to the Ga atomhas one proximate Ga atom in the downward direction, and the one O atomin the lower half has one proximate Ga atom in the upward direction. Theone O atom in the upper half with respect to the Zn atom has oneproximate Zn atom in the downward direction, and the three O atoms inthe lower half each have three proximate Zn atoms in the upwarddirection. In this manner, the number of tetracoordinate O atoms above ametal atom is equal to the number of metal atoms proximate to and belowthe tetracoordinate O atoms; similarly, the number of tetracoordinate Oatoms below a metal atom is equal to the number of metal atoms proximateto and above the tetracoordinate O atoms. Since the coordination numberof the tetracoordinate O atom is 4, the sum of the number of metal atomsproximate to and below the O atom and the number of metal atomsproximate to and above the O atom is 4. Accordingly, when the sum of thenumber of tetracoordinate O atoms above a metal atom and the number oftetracoordinate O atoms below another metal atom is 4, the two kinds ofsmall groups including the metal atoms can be bonded to each other. Forexample, in the case where the hexacoordinate metal (In or Sn) atom isbonded through three tetracoordinate O atoms in the lower half, it isbonded to the pentacoordinate metal (Ga or In) atom or thetetracoordinate metal (Zn) atom.

A metal atom whose coordination number is 4, 5, or 6 is bonded toanother metal atom through a tetracoordinate O atom in the c-axisdirection. In addition, a medium group can be formed in a differentmanner by combining a plurality of small groups so that the totalelectric charge of the layered structure is 0.

FIG. 13A illustrates a model of a medium group included in a layeredstructure of an In—Sn—Zn—O-based material. FIG. 13B illustrates a largegroup including three medium groups. Note that FIG. 13C illustrates anatomic arrangement where the layered structure in FIG. 13B is observedfrom the c-axis direction.

In FIG. 13A, a tricoordinate O atom is omitted for simplicity, and atetracoordinate O atom is illustrated by a circle; the number in thecircle shows the number of tetracoordinate O atoms. For example, threetetracoordinate O atoms existing in each of the upper half and the lowerhalf with respect to a Sn atom is denoted by circled 3. Similarly, inFIG. 13A, one tetracoordinate O atom existing in each of the upper halfand the lower half with respect to an In atom is denoted by circled 1.FIG. 13A also illustrates a Zn atom proximate to one tetracoordinate Oatom in the lower half and three tetracoordinate O atoms in the upperhalf, and a Zn atom proximate to one tetracoordinate O atom in the upperhalf and three tetracoordinate O atoms in the lower half.

In the medium group included in the layered structure of theIn—Sn—Zn—O-based material in FIG. 13A, in the order starting from thetop, a Sn atom proximate to three tetracoordinate O atoms in each of theupper half and the lower half is bonded to an In atom proximate to onetetracoordinate O atom in each of the upper half and the lower half, theIn atom is bonded to a Zn atom proximate to three tetracoordinate Oatoms in the upper half, the Zn atom is bonded to an In atom proximateto three tetracoordinate O atoms in each of the upper half and the lowerhalf through one tetracoordinate O atom in the lower half with respectto the Zn atom, the In atom is bonded to a small group that includes twoZn atoms and is proximate to one tetracoordinate O atom in the upperhalf, and the small group is bonded to a Sn atom proximate to threetetracoordinate O atoms in each of the upper half and the lower halfthrough one tetracoordinate O atom in the lower half with respect to thesmall group. A plurality of such medium groups are bonded to form alarge group.

Here, electric charge for one bond of a tricoordinate O atom andelectric charge for one bond of a tetracoordinate O atom can be assumedto be −0.667 and −0.5, respectively. For example, electric charge of a(hexacoordinate or pentacoordinate) In atom, electric charge of a(tetracoordinate) Zn atom, and electric charge of a (pentacoordinate orhexacoordinate) Sn atom are +3, +2, and +4, respectively. Accordingly,electric charge in a small group including a Sn atom is +1. Therefore,electric charge of −1, which cancels +1, is needed to form a layeredstructure including a Sn atom. As a structure having electric charge of−1, the small group including two Zn atoms as illustrated in FIG. 12Ecan be given. For example, with one small group including two Zn atoms,electric charge of one small group including a Sn atom can be cancelled,so that the total electric charge of the layered structure can be 0.

Specifically, by repeating the large group illustrated in FIG. 13B, anIn—Sn—Zn—O-based crystal (In₂SnZn₃O₈) can be obtained. Note that alayered structure of the obtained In—Sn—Zn—O-based crystal can beexpressed as a composition formula. In₂SnZn₂O₇(ZnO)_(m) (m is 0 or anatural number).

The above-described rule also applies to the following oxides:four-component metal oxide such as In—Sn—Ga—Zn-based oxide;three-component metal oxide such as In—Ga—Zn-based oxide (IGZO),In—Al—Zn-based oxide, Sn—Ga—Zn-based oxide, Al—Ga—Zn-based oxide,Sn—Al—Zn-based oxide, In—Hf—Zn-based oxide, In—La—Zn-based oxide,In—Ce—Zn-based oxide, In—Pr—Zn-based oxide, In—Nd—Zn-based oxide,In—Sm—Zn-based oxide, In—Eu—Zn-based oxide, In—Gd—Zn-based oxide,In—Tb—Zn-based oxide, In—Dy—Zn-based oxide, In—Ho—Zn-based oxide,In—Er—Zn-based oxide, In—Tm—Zn-based oxide, In—Yb—Zn-based oxide, andIn—Lu—Zn-based oxide; two-component metal oxide such as an In—Zn-basedoxide, Sn—Zn-based oxide, Al—Zn-based oxide, Zn—Mg-based oxide,Sn—Mg-based oxide, In—Mg-based oxide, and In—Ga-based oxide; andsingle-component metal oxide such as In-based oxide. Sn-based oxide, andZn-based oxide.

As an example, FIG. 14A illustrates a model of a medium group includedin a layered structure of an In—Ga—Zn—O-based material.

In the medium group included in the layered structure of theIn—Ga—Zn—O-based material in FIG. 14A, in the order starting from thetop, an In atom proximate to three tetracoordinate O atoms in each ofthe upper half and the lower half is bonded to a Zn atom proximate toone tetracoordinate O atom in the upper half, the Zn atom is bonded to aGa atom proximate to one tetracoordinate O atom in each of the upperhalf and the lower half through three tetracoordinate O atoms in thelower half with respect to the Zn atom, and the Ga atom is bonded to anIn atom proximate to three tetracoordinate O atoms in each of the upperhalf and the lower half through one tetracoordinate O atom in the lowerhalf with respect to the Ga atom. A plurality of such medium groups arebonded to form a large group.

FIG. 14B illustrates a large group including three medium groups. Notethat FIG. 14C illustrates an atomic arrangement where the layeredstructure in FIG. 14B is observed from the c-axis direction.

Here, since electric charge of a (hexacoordinate or pentacoordinate) Inatom, electric charge of a (tetracoordinate) Zn atom, and electriccharge of a (pentacoordinate) Ga atom are +3, +2, +3, respectively,electric charge of a small group including any of an In atom, a Zn atom,and a Ga atom is 0. As a result, the total electric charge of a mediumgroup having a combination of such small groups is always 0.

In order to form the layered structure of the In—Ga—Zn—O-based material,a large group can be formed using not only the medium group illustratedin FIG. 14A but also a medium group in which the arrangement of the Inatom, the Ga atom, and the Zn atom is different from that in FIG. 14A.

Specifically, by repeating the large group illustrated in FIG. 14B, anIn—Ga—Zn—O-based crystal can be obtained. Note that a layered structureof the obtained In—Ga—Zn—O-based crystal can be expressed as acomposition formula, InGaO₃(ZnO)_(n) (n is a natural number).

In the case of n=1 (InGaZnO₄), a crystal structure illustrated in FIG.15A can be obtained, for example. Note that in the crystal structure inFIG. 15A, Ga can be replaced with In because a Ga atom and an In atomeach have five ligands as described with reference to FIG. 12B.

In the case of n=2 (InGaZn₂O₅), a crystal structure illustrated in FIG.15B can be obtained, for example. Note that in the crystal structure inFIG. 15B, Ga can be replaced with In because a Ga atom and an In atomeach have five ligands as described with reference to FIG. 12B.

In order to form the CAAC-OS film as the oxide semiconductor film 227,the substrate is heated at a temperature higher than 200° C. and lowerthan or equal to 700° C., preferably higher than 300° C. and lower thanor equal to 500° C., further preferably higher than or equal to 400° C.and lower than or equal to 450° C. during the deposition of the oxidesemiconductor film 227. The oxide semiconductor film 227 is depositedwhile the substrate is heated in the above manner, whereby the oxidesemiconductor film 227 can be the CAAC-OS film.

Alternatively, the oxide semiconductor film 227 of the CAAC-OS film maybe formed in the following manner. A first oxide semiconductor film witha small thickness, specifically in the range from the thickness of oneatomic layer to 10 nm, preferably from 2 nm to 5 nm, is deposited whileheating is performed in the above-described temperature range. Then, asecond oxide semiconductor film with a larger thickness is depositedwhile heating is performed in a similar manner, thereby forming a stackof the first oxide semiconductor film and the second oxide semiconductorfilm.

Further, in order to make the oxide semiconductor film 227 have anamorphous structure, the substrate is not heated or the substrate isheated at a temperature lower than 200° C., preferably lower than 180°C. during the deposition of the oxide semiconductor film 227. The oxidesemiconductor film 227 deposited in such a manner can have an amorphousstructure.

In addition, after the oxide semiconductor film having an amorphousstructure is formed in the above manner, heat treatment may be performedat 250° C. to 700° C., preferably 400° C. or higher, further preferably500° C. or higher, still further preferably 550 “C or higher tocrystallize at least part of the oxide semiconductor film having anamorphous structure, whereby the oxide semiconductor film 227 of theCAAC-OS film may be formed. Note that the heat treatment can beperformed in an inert gas atmosphere. As the inert gas atmosphere, it ispreferable to use an atmosphere that contains nitrogen or a rare gas(e.g., helium, neon, or argon) as its main component and does notcontain water, hydrogen, or the like. For example, the purity ofnitrogen or a rare gas such as helium, neon, or argon introduced into aheat treatment apparatus is 6N (99.9999%) or higher, preferably 7N(99.99999%) or higher (i.e., the impurity concentration is 1 ppm orless, preferably 0.1 ppm or less). Heat treatment for dehydration ordehydrogenation, which is described later, or the like can double asthis heat treatment.

As the substrate heating temperature during the deposition is higher inthe above method, the impurity concentration of the obtained oxidesemiconductor film 227 is decreased. Further, the atomic arrangement inthe oxide semiconductor film 227 is ordered and the density of the oxidesemiconductor film 227 is increased, so that a polycrystalline film or aCAAC-OS film is likely to be formed. Furthermore, when an oxygen gasatmosphere is employed for the deposition, a polycrystalline film or aCAAC-OS film is easily formed because an unnecessary atom such as a raregas is not contained in the oxide semiconductor film 227. Note that amixed gas atmosphere including an oxygen gas and a rare gas may be used.In that case, the percentage of an oxygen gas is 30 vol % or higher,preferably 50 vol % or higher, further preferably 80 vol % or higher.

After the formation of the oxide semiconductor film 227, heat treatmentmay be performed on the oxide semiconductor film 227. The heat treatmentcan further remove substances containing hydrogen atoms in the oxidesemiconductor film 227. The heat treatment is performed in an inert gasatmosphere at a temperature higher than or equal to 300° C. and lowerthan or equal to 700° C., preferably higher than or equal to 450° C. andlower than or equal to 600° C. (lower than the strain point of thesubstrate if the substrate has one). As the inert gas atmosphere, it ispreferable to use an atmosphere that contains nitrogen or a rare gas(e.g., helium, neon, or argon) as its main component and does notcontain water, hydrogen, or the like. For example, the purity ofnitrogen or a rare gas such as helium, neon, or argon introduced into aheat treatment apparatus is 6N (99.9999%) or higher, preferably 7N(99.99999%) or higher (i.e., the impurity concentration is 1 ppm orless, preferably 0.1 ppm or less).

For example, after the semiconductor substrate 201 is introduced into anelectric furnace including a resistance heater or the like, the heattreatment can be performed at 450° C. for one hour in a nitrogenatmosphere.

The heat treatment apparatus is not limited to the electric furnace andmay be an apparatus for heating an object by thermal conduction orthermal radiation from a medium such as a heated gas. For example, arapid thermal annealing (RTA) apparatus such as a gas rapid thermalannealing (GRTA) apparatus or a lamp rapid thermal annealing (LRTA)apparatus can be used. An LRTA apparatus is an apparatus for heating anobject by radiation of light (an electromagnetic wave) emitted from alamp such as a halogen lamp, a metal halide lamp, a xenon arc lamp, acarbon arc lamp, a high pressure sodium lamp, or a high pressure mercurylamp. A GRTA apparatus is an apparatus for performing heat treatmentusing a high-temperature gas. As the gas, an inert gas which does notreact with an object by heat treatment, like nitrogen or a rare gas suchas argon is used. When a GRTA apparatus is used as the heat treatmentapparatus, the substrate may be heated in an inert gas heated to hightemperature of 650° C. to 700° C. because the heat treatment time isshort.

In addition, it is preferable that after the oxide semiconductor film227 is heated through the heat treatment, a high-purity oxygen gas, ahigh-purity N₂O gas, or ultra-dry air (with a moisture content of 20 ppm(−55° C. by conversion into a dew point) or less, preferably 1 ppm orless, further preferably 10 ppb or less, in the case where measurementis performed with the use of a dew point meter of a cavity ring downlaser spectroscopy (CRDS) system) may be introduced into the samefurnace. It is particularly preferable that water, hydrogen, and thelike be not contained in these gases. The purity of the oxygen gas orthe N₂O gas introduced into the heat treatment apparatus is preferably6N or higher, further preferably 7N or higher (i.e., the impurityconcentration in the oxygen gas or the N₂O gas is preferably 1 ppm orless, further preferably 0.1 ppm or less). By the action of the oxygengas or the N₂O gas, oxygen which is one of a main component of the oxidesemiconductor and which has been reduced through the step for removingimpurities by dehydration or dehydrogenation treatment can be supplied.

The above heat treatment has an effect of removing hydrogen, water, andthe like and can be referred to as dehydration, dehydrogenation, or thelike. The heat treatment can be performed, for example, before the oxidesemiconductor film is processed into an island shape or after the gateinsulating film is formed. Such heat treatment for dehydration ordehydrogenation may be conducted once or plural times.

Next, part of the oxide semiconductor film 227 is selectively etched,thereby forming an island-shaped oxide semiconductor film 229. Afterthat, an insulating film 231 is formed over the oxide semiconductor film229 by sputtering, CVD, or the like. Then, a gate electrode 233 isformed over the insulating film 231 (see FIG. 8A).

The insulating film 231 is formed with a single layer or a stack using,for example, one or more of silicon oxide, silicon oxynitride, siliconnitride oxide, aluminum oxide, hafnium oxide, gallium oxide, Ga—Zn-basedmetal oxide, and the like. The insulating film 231 may be an oxideinsulating film from which oxygen is released by heating, such as a filmapplicable to the insulating film 225. By using a film from which oxygenis released by heating as the insulating film 231, oxygen vacancies thatare formed in the oxide semiconductor film 229 by heat treatmentperformed later can be reduced, and deterioration in electriccharacteristics of the transistor can be suppressed.

The insulating film 231 may be formed using a high-k material such ashafnium silicate (HfSiO_(x)), hafnium silicate to which nitrogen isadded (HfSi_(x)O_(y)N_(z)), hafnium aluminate to which nitrogen is added(HfAl_(x)O_(y)N_(z)), hafnium oxide, or yttrium oxide, in which casegate leakage current can be decreased even if the thickness of the gateinsulating film is reduced.

The thickness of the insulating film 231 is preferably from 10 nm to 301nm, further preferably from 5 nm to 50 nm, still further preferably from10 nm to 30 nm.

The gate electrode 233 can be formed using a metal element selected fromaluminum, chromium, copper, tantalum, titanium, molybdenum, andtungsten; an alloy containing any of these metal elements as acomponent; an alloy containing any of these metal elements incombination; or the like. Further, manganese and/or zirconium may beused. The gate electrode 233 may have a single-layer structure or alayered structure of two or more layers. For example, the gate electrode233 can have a single-layer structure of an aluminum film containingsilicon, a two-layer structure in which a titanium film is stacked overan aluminum film, a two-layer structure in which a titanium film isstacked over a titanium nitride film, a two-layer structure in which atungsten film is stacked over a titanium nitride film, a two-layerstructure in which a tungsten film is stacked over a tantalum nitridefilm, or a three-layer structure in which a titanium film, an aluminumfilm, and a titanium film are stacked in this order. Alternatively, thegate electrode 233 may be formed using a film, an alloy film, or anitride film that contains aluminum and one or more elements selectedfrom titanium, tantalum, tungsten, molybdenum, chromium, neodymium, andscandium.

The gate electrode 233 can be formed using a light-transmittingconductive material such as indium tin oxide, indium oxide containingtungsten oxide, indium zinc oxide containing tungsten oxide, indiumoxide containing titanium oxide, indium tin oxide containing titaniumoxide, indium zinc oxide, or indium tin oxide to which silicon oxide isadded. Moreover, The gate electrode 233 can have a layered structureusing the above light-transmitting conductive material and the abovemetal element.

The gate electrode 233 is formed by a printing method or an inkjetmethod. Alternatively, the gate electrode 233 is formed in such a mannerthat a conductive film is formed by sputtering, CVD, evaporation, or thelike and then part of the conductive film is selectively etched.

As a material layer in contact with the insulating film 231, anIn—Ga—Zn—O film containing nitrogen, an In—Sn—O film containingnitrogen, an In—Ga—O film containing nitrogen, an n-Zn—O film containingnitrogen, a Sn—O film containing nitrogen, an In—O film containingnitrogen, or a film of metal nitride (such as InN or ZnN) is preferablyprovided between the gate electrode 233 and the insulating film 231.These films each have a work function of 5 eV or higher, preferably 5.5eV or higher and can make the threshold voltage of the transistorpositive. Accordingly, a “normally-off” switching element can beobtained. For example, in the case of using an In—Ga—Zn—O filmcontaining nitrogen, an In—Ga—Zn—O film having a nitrogen concentrationat least higher than that of the oxide semiconductor film 229,specifically, an In—Ga—Zn—O film having a nitrogen concentration of 7at.% or higher is used.

After the formation of the insulating film 231, heat treatment may beperformed in an inert gas atmosphere or an oxygen atmosphere. The heattreatment temperature is preferably 200° C. to 450° C., furtherpreferably 250° C. to 350° C. With such heat treatment, variations inelectric characteristics of transistors can be reduced. Further, in thecase where the insulating film 225 or the insulating film 231, each ofwhich is in contact with the oxide semiconductor film 229, includesoxygen, oxygen can be supplied to the oxide semiconductor film 229, andoxygen vacancies in the oxide semiconductor film 229 can be filled. Asdescribed above, the heat treatment has an effect of supplying oxygenand therefore can be called treatment for “supply of oxygen”.

Note that in this embodiment, the heat treatment for supply of oxygen isperformed after the insulating film 231 is formed; however, the timingof the heat treatment for supply of oxygen is not limited thereto.

As described above, the heat treatment for dehydration ordehydrogenation and the heat treatment for supply of oxygen areperformed to reduce impurities and fill oxygen vacancies in the oxidesemiconductor film 229, whereby the oxide semiconductor film 229 can behighly purified so as to contain impurities other than main componentsof the oxide semiconductor film 229 as few as possible.

Next, a dopant may be added to the oxide semiconductor film 229 usingthe gate electrode 233 as a mask. In that case, a first region 235 athat is covered with the gate electrode 233 and is thus not doped withthe dopant, and a pair of second regions 235 b and 235 c containing thedopant are formed as illustrated in FIG. 8B. Since the dopant is addedusing the gate electrode 233 as a mask, the first region 235 a to whichthe dopant is not added and the pair of second regions 235 b and 235 ccontaining the dopant can be formed in a self-aligned manner. Note thatthe first region 235 a which overlaps with the gate electrode 233functions as a channel region. The pair of second regions 235 b and 235c containing the dopant functions to relax electric fields (function as“electric field relaxation regions”). The first region 235 a and thepair of second regions 235 b and 235 c containing the dopant compose anoxide semiconductor film 235.

The hydrogen concentration of the first region 235 a in the oxidesemiconductor film 235 is preferably lower than 5×10¹⁸ atoms/cm³ morepreferably 1×10¹⁸ atoms/cm³ or lower, further preferably 5×10¹⁷atoms/cm³ or lower, still further preferably 1×10¹⁶ atoms/cm³ or lower.By bonding between an oxide semiconductor and hydrogen, part ofcontained hydrogen serves as donors to generate electrons as carriers.For that reason, the reduction in the hydrogen concentration of thefirst region 235 a in the oxide semiconductor film 235 can suppress anegative shift of the threshold voltage.

The dopant concentration of the pair of second regions 235 b and 235 cis higher than or equal to 5×10¹⁸ atoms/cm³ and lower than or equal to1×10²² atoms/cm³, preferably higher than or equal to 5×10¹⁸ atoms/cm³and lower than 5×10¹⁹ atoms/cm³.

Since the pair of second regions 235 b and 235 c contains the dopant,the carrier density or the number of defects can be increased.Therefore, the conductivity of the pair of second regions 235 b and 235c can be higher than that of the first region 235 a which does notcontain the dopant. Note that an excessive increase in the dopantconcentration causes inhibition of carrier movement by the dopant, whichleads to a reduction in conductivity of the pair of second regions 235 band 235 c containing the dopant.

The pair of second regions 235 b and 235 e containing the dopantpreferably has a conductivity of 0.1 S/cm to 1000 S/cm, preferably 10S/cm to 1000 S/cm.

The existence of the pair of second regions 235 b and 235 c containingthe dopant in the oxide semiconductor film 235 can relieve electricfields applied to an end portion of the first region 235 a serving asthe channel region. Thus, a short-channel effect of the transistor canbe suppressed.

As a method for adding the dopant to the oxide semiconductor film 229,an ion doping method or an ion implantation method can be used. As thedopant to be added, at least one of boron, nitrogen, phosphorus, andarsenic; at least one of helium, neon, argon, krypton, and xenon; orhydrogen can be used. Alternatively, as the dopant, at least one ofboron, nitrogen, phosphorus, and arsenic; at least one of helium, neon,argon, krypton, and xenon; and hydrogen may be used in combination asappropriate.

Here, the dopant is added to the oxide semiconductor film 229 in a statewhere the oxide semiconductor film 229 is covered with the insulatingfilm and the like; alternatively, the dopant may be added in a statewhere the oxide semiconductor film 229 is exposed.

Further, the dopant can be added by a method other than injectionmethods such as ion doping and ion implantation. For example, a dopantcan be added in the following manner: plasma is generated in anatmosphere of a gas containing an element to be added and plasmatreatment is performed on an object to which the dopant is added. As anapparatus for generating plasma, a dry etching apparatus, a CVDapparatus, a high-density CVD apparatus, or the like can be used.

After that, heat treatment may be performed. The heat treatment isperformed typically at a temperature of 150° C. to 450° C., preferably250° C. to 325° C. In the heat treatment, the temperature may begradually increased from 250° C. to 325° C.

Through the heat treatment, the resistance of the pair of second regions235 b and 235 c containing the dopant can be reduced. In the heattreatment, the pair of second regions 235 b and 235 c containing thedopant may be in either a crystalline state or an amorphous state.

Next, as illustrated in FIG. 8C, sidewall insulating films 237 areformed on side surfaces of the gate electrode 233, and a gate insulatingfilm 239 and electrodes 241 a and 241 b are formed.

The sidewall insulating films 237 are formed with a single layer or astack using one or more of silicon oxide, silicon oxynitride, siliconnitride oxide, silicon nitride, aluminum oxide, aluminum oxynitride,aluminum nitride oxide, aluminum nitride, and the like. Note that likethe insulating film 225, the sidewall insulating films 237 may be formedusing an oxide insulating film from which part of oxygen is released byheating.

A method for forming the sidewall insulating films 237 is describedbelow.

First, an insulating film to be the sidewall insulating films 237 isformed over the insulating film 231 and the gate electrode 233. Theinsulating film is formed by sputtering, CVD, or the like. There is noparticular limitation on the thickness of the insulating film, and thethickness is selected as appropriate so that the insulating film cancover the gate electrode 233.

Then, part of the insulating film is removed by etching, thereby formingthe sidewall insulating films 237. The etching here is highlyanisotropic etching, and the sidewall insulating films 237 can be formedin a self-aligned manner by performing the highly anisotropic etching onthe insulating film.

The width of the electric field relaxation region in each of the pair ofsecond regions 235 b and 235 c containing the dopant depends on thewidth of the sidewall insulating film 237, and the width of the sidewallinsulating film 237 depends on the thickness of the gate electrode 233.Therefore, the thickness of the gate electrode 233 is determined so thatthe electric field relaxation region has a desired area.

The gate insulating film 239 can be formed by removing the insulatingfilm 231 by highly anisotropic etching to expose the oxide semiconductorfilm 235 in the step of forming the sidewall insulating films 237.

The pair of electrodes 241 a and 241 b can be formed using a materialsimilar to that for the wirings 223 a and 223 b as appropriate. Notethat the pair of electrodes 241 a and 241 b may function as wirings.

The pair of electrodes 241 a and 241 b is formed by a printing method oran inkjet method. Alternatively, the pair of electrodes 241 a and 241 bis formed in such a manner that a conductive film is formed bysputtering, CVD, evaporation, or the like and then part of theconductive film is selectively etched.

The pair of electrodes 241 a and 241 b is preferably formed to be incontact with side surfaces of the sidewall insulating films 237 and sidesurfaces of the gate insulating film 239. In other words, it ispreferable that end portions of the pair of electrodes 241 a and 241 bof the transistor be located over the sidewall insulating films 237 andentirely cover exposed portions of the pair of second regions 235 b and235 c containing the dopant in the oxide semiconductor film 235.Accordingly, in the pair of second regions 235 b and 235 c containingthe dopant, regions in contact with the pair of electrodes 241 a and 241b serve as a source region and a drain region, whereas regionsoverlapping with the sidewall insulating films 237 and the gateinsulating film 239 serve as electric field relaxation regions. Inaddition, since the width of the electric field relaxation region can becontrolled with the length of the sidewall insulating film 237, thedegree of the accuracy of mask alignment for forming the pair ofelectrodes 241 a and 241 b can be lowered. Thus, variations betweentransistors can be reduced.

Although the sidewall insulating films 237 are provided in contact withthe side surfaces of the gate electrode 233 in this embodiment, thepresent invention is not limited to this structure and the sidewallinsulating films 237 are not necessarily provided. In addition, thesidewall insulating films 237 are provided after the formation of thepair of second regions 235 b and 235 c in this embodiment; however, thepresent invention is not limited to this, and the pair of second regions235 b and 235 c may be formed after the sidewall insulating films 237are provided. In that case, the area of the first region 235 a can beincreased by regions overlapping with the sidewall insulating films 237.

Next, as illustrated in FIG. 9A, an insulating film 243 and aninsulating film 245 are formed by sputtering, CVD, coating, printing, orthe like.

Each of the insulating films 243 and 245 is formed with a single layeror a stack using one or more of silicon oxide, silicon oxynitride,silicon nitride oxide, silicon nitride, aluminum oxide, aluminumoxynitride, aluminum nitride oxide, aluminum nitride, and the like. Whenan insulating film that prevents diffusion of oxygen to the outside isused as the insulating film 245, oxygen released from the insulatingfilm 243 can be supplied to the oxide semiconductor film. Typicalexamples of the insulating film that prevents diffusion of oxygen to theoutside are an aluminum oxide film and an aluminum oxynitride film. Inaddition, when an insulating film that prevents diffusion of hydrogenfrom the outside is used as the insulating film 245, diffusion ofhydrogen from the outside to the oxide semiconductor film can bereduced, and oxygen vacancies in the oxide semiconductor film can bereduced. Typical examples of the insulating film that prevents diffusionof hydrogen from the outside are films of silicon nitride, siliconnitride oxide, aluminum nitride, and aluminum nitride oxide. Further,when the insulating film 243 has a three-layer structure in which anoxide insulating film from which part of oxygen is released by heating,an insulating film that prevents diffusion of oxygen to the outside, andan oxide insulating film are stacked, diffusion of oxygen into the oxidesemiconductor film can be efficiently performed and release of oxygen tothe outside can be suppressed: thus, the change in the characteristicsof the transistor can be reduced even at high temperature and highhumidity.

Through the above steps, the oxide semiconductor transistor 110 can befabricated as illustrated in FIG. 9A. Note that the oxide semiconductortransistor 110 includes the oxide semiconductor film 235 which is i-type(intrinsic) or substantially i-type, and therefore has exceptionalcharacteristics.

Note that the transistor 110 has a top-gate structure in thisembodiment; however, the present invention is not limited to this andthe transistor 110 may have a bottom-gate structure, for example.Further, in the transistor 110 in this embodiment, the pair ofelectrodes 241 a and 241 b is in contact with at least part of topsurfaces of the pair of second regions 235 b and 235 c; however, thepresent invention is not limited to this structure, and for example, thepair of second regions 235 b and 235 c may be in contact with at leastpart of the pair of electrodes 241 a and 241 b. Moreover, an impurityregion is not necessarily provided in the oxide semiconductor film 229.

Next, parts of the insulating films 215, 217, 221, 225, 243, and 245 areselectively etched to form openings, whereby parts of the gate electrode209 and the electrodes 241 a and 241 b are exposed. Subsequently, aconductive film is formed in the openings, and then part of theconductive film is selectively etched to form a wiring 249 in contactwith the electrode 241 b and a wiring 250 in contact with the electrode241 a. For the wirings 249 and 250, a material for the contact plugs 219a and 219 b can be used as appropriate.

Here, the wiring 249 functions as a node that electrically connects oneof the source electrode and the drain electrode of the transistor 110and the gate electrode 209 of the transistor 112. The wiring 250functions as the other of the source electrode and the drain electrodeof the transistor 110 and is electrically connected to the bit line Billustrated in FIG. 1. Although not directly shown in FIG. 9B, the gateelectrode 233 of the transistor 110 is electrically connected to theword line W illustrated in FIG. 1.

In FIG. 9B, one of the source electrode and the drain electrode (theelectrode 241 b) of the transistor 110 and the gate electrode 209 of thetransistor 112 are connected through the wiring 249; however, thisembodiment is not limited to this structure. For example, a top surfaceof the gate electrode of the transistor 112 may be exposed from a topsurface of the insulating film provided over the transistor 112, and oneof the source electrode and the drain electrode of the transistor 110may be provided in direct contact with the top surface of the gateelectrode.

Through the above steps, the transistors 110 and 112 which serve as aswitch of the unit cell can be fabricated.

As has been described, the transistor including a wide bandgapsemiconductor, such as an oxide semiconductor, with which the off-statecurrent can be sufficiently low is used for a switch of the unit cellincluded in the programmable circuit, whereby data for switching aconducting state and a non-conducting state of the unit cell can be heldfor a long time even when supply of the power supply potential isinterrupted. In addition, a plurality of unit cells including analogelements are provided in the programmable circuit and the state of eachunit cell is switched between a conducting state and a non-conductingstate, so that an analog value in the entire programmable circuit can bemade variable.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

Embodiment 4

In this embodiment, the field-effect mobility of the transistorincluding the oxide semiconductor film described in Embodiment 3 will bederived theoretically, and the transistor characteristics will bederived from the field-effect mobility.

The actually measured field-effect mobility of an insulated gatetransistor is lower than its original mobility for a variety of reasons;this phenomenon occurs not only in the case of using an oxidesemiconductor. One of the reasons that reduce the mobility is a defectinside a semiconductor or a defect at an interface between thesemiconductor and an insulating film. When a Levinson model is used, thefield-effect mobility on the assumption that no defect exists inside thesemiconductor can be calculated theoretically.

Assuming a potential barrier (such as a grain boundary) exists in asemiconductor, the measured field-effect mobility of the semiconductor,denoted by it, is expressed by Formula 2 where the inherent field-effectmobility of the semiconductor is μ₀.

$\begin{matrix}{\mu = {\mu_{0}{\exp \left( {- \frac{E}{kT}} \right)}}} & \left\lbrack {{Formula}\mspace{14mu} 2} \right\rbrack\end{matrix}$

Here, E denotes the height of the potential barrier, k denotes theBoltzmann constant, and T denotes the absolute temperature. Further, onthe assumption that the potential barrier is attributed to a defect, theheight of the potential barrier is expressed by Formula 3 according tothe Levinson model.

$\begin{matrix}{E = {\frac{e^{2}N^{2}}{8ɛ\mspace{14mu} n} = \frac{e^{3}N^{2}t}{8ɛ\mspace{14mu} C_{ox}V_{g}}}} & \left\lbrack {{Formula}\mspace{14mu} 3} \right\rbrack\end{matrix}$

Here, e represents the elementary charge, N represents the averagedefect density per unit area in a channel, ∈ represents the dielectricconstant of the semiconductor, n represents the number of carriers perunit area in the channel, C_(ox) represents the capacitance per unitarea, V_(g) represents the gate voltage, and t represents the thicknessof the channel. In the case where the thickness of a semiconductor layeris 30 nm or less, the thickness of the channel can be regarded as beingthe same as the thickness of the semiconductor layer. The drain currentI_(d) in a linear region is expressed by Formula 4.

$\begin{matrix}{I_{d} = {\frac{W\; \mu \; V_{g}V_{d}C_{ox}}{L}{\exp \left( {- \frac{E}{kT}} \right)}}} & \left\lbrack {{Formula}\mspace{14mu} 4} \right\rbrack\end{matrix}$

Here, L represents the channel length and W represents the channelwidth, and, and Ware each 10 μm in this case. In addition, V_(d)represents the drain voltage.

When dividing both sides of the Formula 4 by V_(g) and then takinglogarithms of both sides, Formula 5 is obtained.

$\begin{matrix}\begin{matrix}{{\ln \left( \frac{I_{d}}{V_{g}} \right)} = {{\ln \left( \frac{W_{\mu}V_{d}C_{ox}}{L} \right)} - \frac{E}{kT}}} \\{= {{\ln \left( \frac{W_{\mu}V_{d}C_{ox}}{L} \right)} - \frac{e^{3}N^{2}t}{8{kT}\; ɛ\mspace{14mu} C_{ox}V_{g}}}}\end{matrix} & \left\lbrack {{Formula}\mspace{14mu} 5} \right\rbrack\end{matrix}$

The right side of Formula 5 is a function of V_(g). From Formula 5, itis found that the defect density N can be obtained from a line in agraph that is obtained by plotting actual measured values withIn(I_(d)V_(g)) as the ordinate and 1/V_(g) as the abscissa. That is, thedefect density can be evaluated from the I_(d)−V_(g) characteristics ofthe transistor. The defect density N of an oxide semiconductor in whichthe ratio of indium (In), tin (Sn), and zinc (Zn) is 1:1:1 isapproximately 1×10¹²/cm².

On the basis of the defect density obtained in this manner, or the like,μ₀ can be calculated to be 120 cm²/V·s from Formula 2 and Formula 3. Themeasured mobility of an In—Sn—Zn oxide having a defect is approximately40 cm³/V·s. However, assuming that no defect exists inside thesemiconductor and at the interface between the semiconductor and aninsulating film, the mobility μ₀ of the oxide semiconductor is expectedto be 120 cm²/V·s.

Note that even when no defect exists inside a semiconductor, scatteringat an interface between a channel and a gate insulator affects thetransport property of the transistor. In other words, the mobility μ₁ ata position that is distance x away from the interface between thechannel and the gate insulator is expressed by Formula 6.

$\begin{matrix}{\frac{1}{\mu_{1}} = {\frac{1}{\mu_{0}} + {\frac{D}{B}{\exp \left( {- \frac{x}{l}} \right)}}}} & \left\lbrack {{Formula}\mspace{14mu} 6} \right\rbrack\end{matrix}$

Here, D represents the electric field in the gate direction, and B and lare constants. The values of B and l can be obtained from actualmeasurement results, according to the above measurement results, B is4.75×10⁷ cm/s and l is 10 nm (the depth to which the influence ofinterface scattering reaches). When D is increased (i.e., when the gatevoltage is increased), the second term of Formula 6 is increased andaccordingly the mobility t, is decreased.

FIG. 16 shows calculation results of the mobility μ₂ of a transistorwhose channel formation region is formed using an ideal oxidesemiconductor without a defect inside the semiconductor. For thecalculation, device simulation software Sentaurus Device manufactured bySynopsys, Inc. was used, and the bandgap, the electron affinity, therelative permittivity, and the thickness of the oxide semiconductor wereassumed to be 2.8 eV, 4.7 eV, 15, and 15 nm, respectively. These valueswere obtained by measurement of a thin film that was formed bysputtering.

Further, the work functions of a gate, a source, and a drain wereassumed to be 5.5 eV, 4.6 eV, and 4.6 eV, respectively. The thickness ofa gate insulator was assumed to be 100 nm, and the relative permittivitythereof was assumed to be 4.1. The channel length and the channel widthwere each assumed to be 10 μm, and the drain voltage V_(d) was assumedto be 0.1 V.

As shown in FIG. 16, the mobility has a peak of more than 100 cm²V·s ata gate voltage that is a little over 1 V, and is decreased as the gatevoltage becomes higher because the influence of interface scattering isincreased. Note that in order to reduce interface scattering, it ispreferable that a surface of the semiconductor layer be flat at theatomic level (atomic layer flatness).

FIGS. 17A to 17C, FIGS. 18A to 18C, and FIGS. 19A to 19C showcalculation results of characteristics of minute transistors formedusing an oxide semiconductor having such a mobility. FIGS. 20A and 20Billustrate cross-sectional structures of the transistors used for thecalculation. The transistors illustrated in FIGS. 20A and 20B eachinclude a second region 1103 b and a second region 1103 c that haven⁺-type conductivity in an oxide semiconductor layer. The resistivity ofthe second regions 1103 b and 1103 c is 2×10⁻³ Ω·cm.

The transistor in FIG. 20A is formed over a base insulating film 1101and an embedded insulator 1102 that is formed using aluminum oxide andembedded in the base insulating film 1101. The transistor includes thesecond regions 1103 b and 1103 c, an intrinsic first region 1103 a thatis positioned between the second regions 1103 b and 1103 c and serves asa channel formation region, and a gate electrode 1105. The width of thegate electrode 1105 is 33 nm.

A gate insulating film 1104 is formed between the gate electrode 1105and the first region 1103 a. A sidewall insulating film 1106 a and asidewall insulating film 1106 b are formed on both side surfaces of thegate electrode 1105. An insulator 1107 is formed over the gate electrode1105 to prevent a short circuit between the gate electrode 1105 andanother wiring. The sidewall insulating film has a width of 5 nm. Asource electrode 1108 a and a drain electrode 1108 b are provided incontact with the second region 1103 b and the second region 1103 c,respectively. Note that the channel width of the transistor is 40 nm.

The transistor in FIG. 20B is the same as the transistor in FIG. 20A inthat it is formed over the base insulating film 1101 and the embeddedinsulator 1102 formed using aluminum oxide and that it includes thesecond region 1103 b, the second region 1103 c, the intrinsic firstregion 1103 a provided therebetween, the gate electrode 1105 having awidth of 33 am, the gate insulating film 1104, the sidewall insulatingfilm 1106 a, the sidewall insulating film 1106 b, the insulator 1107,the source electrode 1108 a, and the drain electrode 1108 b.

The transistor in FIG. 20A is different from the transistor in FIG. 20Bin the conductivity type of semiconductor regions under the sidewallinsulating films 1106 a and 1106 b. In the transistor in FIG. 20A, thesemiconductor regions under the sidewall insulating films 1106 a and1106 b are parts of the second regions 1103 b and 1103 c having n⁺-typeconductivity, whereas in the transistor in FIG. 20B, the semiconductorregions under the sidewall insulating films 1106 a and 1106 b are partsof the intrinsic first region 1103 a. In other words, a region having awidth of L_(off) which overlaps with neither the second region 1103 b(the second region 1103 c) nor the gate electrode 1105 is provided. Thisregion is called an offset region, and the width L_(off) is called anoffset length. As is seen from the drawing, the offset length is equalto the width of the sidewall insulating film 1106 a (the sidewallinsulating film 1106 b).

The other parameters used in the calculation are as described above. Forthe calculation, device simulation software Sentaurus Devicemanufactured by Synopsys, Inc. was used. FIGS. 17A to 17C show the gatevoltage (V_(g): a potential difference between the gate and the source)dependence of the drain current (I_(d), a solid line) and the mobility(p, a dotted line) of the transistor having the structure illustrated inFIG. 20A. The drain current I_(d) is obtained by calculation under theassumption that the drain voltage (a potential difference between thedrain and the source) is +1 V and the mobility μ is obtained bycalculation under the assumption that the drain voltage is +0.1 V.

FIG. 17A shows the gate voltage dependence of the transistor in the casewhere the thickness of the gate insulating film is 15 nm, FIG. 17B showsthat of the transistor in the case where the thickness of the gateinsulating film is 10 nm, and FIG. 17C shows that of the transistor inthe case where the thickness of the gate insulating film is 5 am. As thegate insulating film is thinner, the drain current I_(d) in the offstate (off-state current) in particular is significantly decreased. Incontrast, there is no noticeable change in the peak value of themobility μ and the drain current I_(d) in the on state (on-statecurrent). The graphs show that the drain current exceeds 10 μA, which isrequired in a memory element and the like, at a gate voltage of around 1V.

FIGS. 18A to 18C show the gate voltage V_(g) dependence of the draincurrent I_(d) (a solid line) and the mobility μ(a dotted line) of thetransistor having the structure in FIG. 20B and an offset length L_(off)of 5 nm. The drain current I_(d) is obtained by calculation under theassumption that the drain voltage is +1 V and the mobility μ is obtainedby calculation under the assumption that the drain voltage is +0.1 V.FIG. 18A shows the gate voltage dependence of the transistor in the casewhere the thickness of the gate insulating film is 15 nm, FIG. 18B showsthat of the transistor in the case where the thickness of the gateinsulating film is 10 nm, and FIG. 18C shows that of the transistor inthe case where the thickness of the gate insulating film is 5 nm.

FIGS. 19A to 19C show the gate voltage dependence of the drain currentI_(d) (a solid line) and the mobility μ (a dotted line) of thetransistor having the structure in FIG. 20B and an offset length L_(off)of 15 nm. The drain current I_(d) is obtained by calculation under theassumption that the drain voltage is 4-1 V and the mobility μ isobtained by calculation under the assumption that the drain voltage is+0.1 V. FIG. 19A shows the gate voltage dependence of the transistor inthe case where the thickness of the gate insulating film is 15 nm, FIG.19B shows that of the transistor in the case where the thickness of thegate insulating film is 10 nm, and FIG. 19C shows that of the transistorin the case where the thickness of the gate insulating film is 5 am.

In either of the structures, as the gate insulating film is thinner, theoff-state current is significantly decreased, whereas no noticeablechange arises in the peak value of the mobility μ and the on-statecurrent.

Note that the peak of the mobility μ is approximately 80 cm²/V·s inFIGS. 17A to 17C, approximately 60 cm²/V·s in FIGS. 18A to 18C, andapproximately 40 cm³V·s in FIGS. 19A to 19C: thus, the peak of themobility μ is decreased as the offset length L_(off) is increased.Further, the same applies to the off-state current. The on-state currentis also decreased as the offset length L_(off) is increased; however,the decrease in the on-state current is much more gradual than thedecrease in the off-state current. Further, the graphs show that ineither of the structures, the drain current exceeds 10 μA, which isrequired in a memory element and the like, at a gate voltage of around 1V. When the transistor with such high mobility is used in a memory unitof the unit cell included in the programmable circuit shown in theforegoing embodiments, data for switching the state of the unit cell canbe written at high speed.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

Embodiment 5

In this embodiment, a transistor including the oxide semiconductor filmcontaining In, Sn, and Zn as its main components will be specificallydescribed as an example of the transistor including the oxidesemiconductor film shown in Embodiments 3 and 4.

A transistor in which an oxide semiconductor containing In, Sn, and Znas its main components is used for a channel formation region can havefavorable characteristics by depositing the oxide semiconductor whileheating a substrate or by performing heat treatment after the oxidesemiconductor film is formed. Note that a main component refers to anelement included in a composition at 5 atomic % or more.

By intentionally heating the substrate after formation of the oxidesemiconductor film containing In, Sn, and Zn as its main components, thefield-effect mobility of the transistor can be increased. Further, thethreshold voltage of the transistor can be positively shifted to makethe transistor normally off. A description is given below of fabricationof a transistor including an oxide semiconductor film containing In, Sn,and Zn as its main components and the results of various measurements ofthe transistor.

First, the structure of the transistor used for various measurements inthis embodiment will be described with reference to FIGS. 26A and 26B.FIG. 26A is a plan view of the transistor, and FIG. 26B is across-sectional view along dashed line A-B in FIG. 26A.

The transistor illustrated in FIG. 26B includes a substrate 600, a baseinsulating film 602 provided over the substrate 600, an oxidesemiconductor film 606 provided over the base insulating film 602, apair of electrodes 614 in contact with the oxide semiconductor film 606,a gate insulating film 608 provided over the oxide semiconductor film606 and the pair of electrodes 614, a gate electrode 610 provided tooverlap with the oxide semiconductor film 606 with the gate insulatingfilm 608 positioned therebetween, an interlayer insulating film 616provided to cover the gate insulating film 608 and the gate electrode610, wirings 618 electrically connected to the pair of electrodes 614through openings formed in the interlayer insulating film 616, and aprotective film 620 provided to cover the interlayer insulating film 616and the wirings 618. The pair of electrodes 614 functions as source anddrain electrodes of the transistor.

Here, the substrate 600 was a glass substrate. The base insulating film602 was a silicon oxide film. The oxide semiconductor film 606 was ann-Sn—Zn—O film. As the pair of electrodes 614, a tungsten film was used.The gate insulating film 608 was a silicon oxide film. The gateelectrode 610 had a layered structure of a tantalum nitride film and atungsten film. The interlayer insulating film 616 had a layeredstructure of a silicon oxynitride film and a polyimide film. The wirings618 had a layered structure in which a titanium film, an aluminum film,and a titanium film were formed in this order. The protective film 620was a polyimide film.

Note that in the transistor having the structure illustrated in FIG.26A, the width of a portion where the gate electrode 610 overlaps withone of the pair of electrodes 614 is referred to as Lov. Similarly, thewidth of a portion of the pair of electrodes 614, which does not overlapwith the oxide semiconductor film 606, is referred to as dW.

FIGS. 21A to 21C each show characteristics of a transistor that has thestructure illustrated in FIGS. 26A and 26B and includes an oxidesemiconductor film with a channel length L of 3 μm and a channel width Wof 10 μm, and a 100-nm-thick gate insulating film. Note that V_(d) wasset to 10 V.

FIG. 21A shows characteristics of a transistor whose oxide semiconductorfilm containing In, Sn, and Zn as its main components was formed bysputtering without heating a substrate intentionally. The field-effectmobility of the transistor is 18.8 cm²/V·s. On the other hand, when theoxide semiconductor film containing In, Sn, and Zn as its maincomponents is formed while the substrate is heated intentionally, thefield-effect mobility can be increased. FIG. 21B shows characteristicsof a transistor whose oxide semiconductor film containing In, Sn, and Znas its main components was formed while heating a substrate at 200° C.The field-effect mobility of the transistor is 32.2 cm²/V·s.

The field-effect mobility can be further increased by performing heattreatment after formation of the oxide semiconductor film containing In,Sn, and Zn as its main components. FIG. 21C shows characteristics of atransistor whose oxide semiconductor film containing In, Sn, and Zn asits main components was formed by sputtering at 200° C. and thensubjected to heat treatment at 650° C. The field-effect mobility of thetransistor is 34.5 cm²/V·s.

The intentional heating of the substrate is expected to have an effectof reducing moisture taken into the oxide semiconductor film during thedeposition by sputtering. Further, the heat treatment after thedeposition enables hydrogen, a hydroxyl group, or moisture to bereleased and removed from the oxide semiconductor film. In this manner,the field-effect mobility can be increased. Such an increase infield-effect mobility is presumed to be achieved not only by removal ofimpurities by dehydration or dehydrogenation but also by a reduction ininteratomic distance due to an increase in density. The oxidesemiconductor can be crystallized by being highly purified by removal ofimpurities from the oxide semiconductor. In the case of using such ahighly purified non-single-crystal oxide semiconductor, ideally, afield-effect mobility exceeding 100 cm²/V·s is expected to be realized.

The oxide semiconductor containing In, Sn, and Zn as its main componentsmay be crystallized in the following manner: oxygen ions are implantedinto the oxide semiconductor, hydrogen, a hydroxyl group, or moistureincluded in the oxide semiconductor is released by heat treatment, andthe oxide semiconductor is crystallized through the heat treatment or byanother heat treatment performed later. By such crystallizationtreatment or recrystallization treatment, a non-single crystal oxidesemiconductor having favorable crystallinity can be obtained.

The intentional heating of the substrate during the deposition and/orthe heat treatment after the deposition contributes not only toincreasing field-effect mobility but also to making the transistornormally off. In a transistor in which an oxide semiconductor film thatcontains In, Sn, and Zn as its main components and is formed withoutheating a substrate intentionally is used as a channel formation region,the threshold voltage tends to be shifted negatively. In contrast, whenthe oxide semiconductor film formed while heating the substrateintentionally is used, the problem of the negative shift of thethreshold voltage can be solved. That is, the threshold voltage isshifted so that the transistor becomes normally off; this tendency canbe confirmed by comparison between FIGS. 21A and 21B.

Note that the threshold voltage can also be controlled by changing theratio of In, Sn, and Zn; when the composition ratio of In, Sn, and Zn is2:1:3, a normally-off transistor is expected to be formed. In addition,an oxide semiconductor film having high crystallinity can be obtained byusing a target with a composition ratio of In:Sn:Zn=2:1:3.

The temperature of the intentional heating of the substrate or thetemperature of the heat treatment is 150° C. or higher, preferably 200°C. or higher, further preferably 400° C. or higher. When the depositionor heat treatment is performed at a high temperature, the transistor canbe normally off.

The heat treatment can be performed in an oxygen atmosphere;alternatively, the heat treatment may be performed first in anatmosphere of nitrogen or an inert gas or under reduced pressure, andthen in an atmosphere including oxygen. Oxygen is supplied to the oxidesemiconductor after dehydration or dehydrogenation, whereby an effect ofthe heat treatment can be further enhanced. In order to supply oxygenafter dehydration or dehydrogenation, a method in which oxygen ions areaccelerated by electric fields and implanted into the oxidesemiconductor film may be employed.

A defect due to oxygen vacancy is easily caused in the oxidesemiconductor or at an interface between the oxide semiconductor and astacked film: however, when excess oxygen is included in the oxidesemiconductor by the heat treatment, oxygen vacancy caused constantlycan be compensated for with excess oxygen. The excess oxygen is oxygenexisting mainly between lattices. When the concentration of oxygen isset in the range of 1×□10¹⁶/cm³ to 2×□10²/cm³, excess oxygen can beincluded in the oxide semiconductor without causing crystal distortionor the like.

When heat treatment is performed so that at least part of the oxidesemiconductor includes crystal, a more stable oxide semiconductor filmcan be obtained. For example, when an oxide semiconductor film that isformed by sputtering using a target having a composition ratio ofIn:Sn:Zn=1:1:1 without heating a substrate intentionally is analyzed byX-ray diffraction (XRD), a halo pattern is observed. The formed oxidesemiconductor film can be crystallized by being subjected to heattreatment. The temperature of the heat treatment can be set asappropriate; when the heat treatment is performed at 650° C., forexample, a clear diffraction peak can be observed with X-raydiffraction.

An XRD analysis of an In—Sn—Zn—O film was conducted. The XRD analysiswas conducted using an X-ray diffractometer D8 ADVANCE manufactured byBruker AXS, and measurement was performed by an out-of-plane method.

Sample A and Sample B were prepared and the XRD analysis was performedthereon. Methods for manufacturing Sample A and Sample B will bedescribed below.

An In—Sn—Zn—O film with a thickness of 100 nm was formed over a quartzsubstrate that had been subjected to dehydrogenation treatment.

The In—Sn—Zn—O film was formed with a sputtering apparatus with a powerof 100 W (DC) in an oxygen atmosphere. An In—Sn—Zn—O target having anatomic ratio of In:Sn:Zn=1:1:1 was used as a target. Note that thesubstrate heating temperature in film formation was 200° C. A samplemanufactured in this manner was used as Sample A.

Next, a sample manufactured by a method similar to that of Sample A wassubjected to heat treatment at 650° C. As the heat treatment, heattreatment in a nitrogen atmosphere was first performed for one hour andthen heat treatment in an oxygen atmosphere was performed for one hourwithout lowering the temperature. A sample manufactured in this mannerwas used as Sample B.

FIG. 22 shows XRD spectra of Sample A and Sample B. No peak derived froma crystal was observed in Sample A, whereas peaks derived from a crystalwere observed when 20 was around 35 deg and 37 deg to 38 deg in SampleB.

As described above, by intentionally heating a substrate duringdeposition of an oxide semiconductor containing In, Sn, and Zn as itsmain components and/or by performing heat treatment after thedeposition, characteristics of a transistor can be improved.

These substrate heating and heat treatment have an effect of preventinghydrogen and a hydroxyl group, which are unfavorable impurities for anoxide semiconductor, from being included in the film or an effect ofremoving hydrogen and a hydroxyl group from the film. That is, an oxidesemiconductor can be highly purified by removing hydrogen serving as adonor impurity from the oxide semiconductor, whereby a normally-offtransistor can be obtained. The high purification of the oxidesemiconductor enables the off-state current of the transistor to be 1aA/μm or lower. Here, the unit of the off-state current representscurrent per micrometer of a channel width.

FIG. 23 shows a relation between the off-state current of a transistorand the inverse of substrate temperature (absolute temperature) atmeasurement. Here, for simplicity, the horizontal axis represents avalue (1000/T) obtained by multiplying an inverse of the substratetemperature at measurement by 1000.

Specifically, as shown in FIG. 23, the off-state current was 0.1 aA/μm(1×10⁻¹⁹ A/μm) or lower, and 10 zA/μm (1×10⁻²⁰ A/μn) or lower when thesubstrate temperature was 125° C. and 85° C., respectively. Theproportional relation between the logarithm of the off-state current andthe inverse of the temperature suggests that the off-state current atroom temperature (27° C.) is 0.1 zA/μm (1×10⁻²¹ A/μm) or lower. Hence,the off-state current can be 1 zA/μm (1×10⁻²¹ A/μm) or lower, 100 zA/μm(1×10⁻¹⁹ A/μm) or lower, and 1 zA/μm (1×10⁻²¹ A/μm) or lower at 125° C.,85° C., and room temperature, respectively.

Note that in order to prevent hydrogen and moisture from being includedin the oxide semiconductor film during the deposition, it is preferableto increase the purity of a sputtering gas by sufficiently suppressingleakage from the outside of a deposition chamber and degasificationthrough an inner wall of the deposition chamber. For example, a gas witha dew point of −70° C. or lower is preferably used as the sputtering gasin order to prevent moisture from being included in the film. Inaddition, it is preferable to use a target which is highly purified soas not to include impurities such as hydrogen and moisture. Although itis possible to remove moisture from a film of an oxide semiconductorcontaining In, Sn, and Zn as its main components by heat treatment, afilm that does not include moisture originally is preferably formedbecause moisture is released from the oxide semiconductor containing In,Sn, and Zn as its main components at a higher temperature than from anoxide semiconductor containing In, Ga, and Zn as its main components.

The relation between the substrate temperature and electriccharacteristics of a transistor of Sample B, on which heat treatment at650° C. was performed after formation of the oxide semiconductor film,was evaluated.

The transistor used for the measurement has a channel length L of 3 μm,a channel width W of 10 μm, Lov of 3 μm on one side (total Lov of 6 μm),and dW of 0 μm. Note that V_(d) was set to 10 V. The substratetemperature was −40° C., −25° C. 25° C., 75° C., 125° C., and 150° C.Here, in the transistor, the width of a portion where a gate electrodeoverlaps with one of a pair of electrodes is referred to as Lov, and thewidth of a portion of the pair of electrodes, which does not overlapwith an oxide semiconductor film, is referred to as dW.

FIG. 24 shows the V_(g) dependence of I_(d) (a solid line) andfield-effect mobility (a dotted line). FIG. 25A shows a relation betweenthe substrate temperature and the threshold voltage, and FIG. 25B showsa relation between the substrate temperature and the field-effectmobility.

From FIG. 25A, it is found that the threshold voltage gets lower as thesubstrate temperature increases. Note that the threshold voltage isdecreased from 1.09 V to −0.23 V in the range from −40° C. to 150° C.

From FIG. 25B, it is found that the field-effect mobility gets lower asthe substrate temperature increases. Note that the field-effect mobilityis decreased from 36 cm²/V·s to 32 cm²n/V·s in the range from −40° C. to150° C. Thus, it is found that variation in electric characteristics issmall in the above temperature range.

In the transistor including the oxide semiconductor layer containing In,Sn, and Zn as its main components, the field-effect mobility can be 30cm²/V·s or higher, preferably 40 cm²/V·s or higher, further preferably60 cm²/V·s or higher with the off-state current maintained at 1 aA/μm orlower, and can have on-state current high enough to meet thespecifications demanded for LSIs. For example, in an FET with a channelwidth of 40 nm and a channel length of 33 nm, an on-state current of 12μA or higher can flow when the gate voltage is 2.7 V and the drainvoltage is 1.0 V.

When the transistor with such low off-state current is used in a memoryunit of the programmable switch shown in the foregoing embodiments,configuration data can be held even when supply of the power supplypotential is interrupted. Thus, write of configuration data after poweron can be omitted, so that the start time of the logic block can beshortened. Accordingly, a programmable logic device in which powerconsumption can be reduced by employing a normally-off driving methodcan be provided.

In addition, when the transistor with such low off-state current is usedin a memory unit of the programmable switch shown in the foregoingembodiments, configuration data can be written at high speed, so that aprogrammable logic device in which dynamic reconfiguration can be easilyachieved can be provided.

Since the transistor including the oxide semiconductor has suchcharacteristics, it is possible to provide a programmable logic devicewhose operation speed is not decreased even when the transistorincluding the oxide semiconductor is included in an integrated circuitformed using a silicon semiconductor.

Embodiment 6

With the use of a programmable circuit according to one embodiment ofthe present invention, a low-power electronic device can be provided. Inparticular, when a low-power semiconductor device according to oneembodiment of the present invention is added as a component of aportable electronic device which has difficulty in continuouslyreceiving power, the portable electronic device can have a longcontinuous operation time.

A semiconductor device including a programmable circuit according to oneembodiment of the present invention can be used for display devices,personal computers, or image reproducing devices provided with recordingmedia (typically, devices that reproduce the content of recording mediasuch as digital versatile discs (DVDs) and have displays for displayingthe reproduced images). Other examples of electronic devices that caninclude a semiconductor device according to one embodiment of thepresent invention are mobile phones, game machines including portablegame machines, personal digital assistants, e-book readers, cameras suchas video cameras and digital still cameras, goggle-type displays (headmounted displays), navigation systems, audio reproducing devices (e.g.,car audio systems and digital audio players), copiers, facsimiles,printers, multifunction printers, automated teller machines (ATM), andvending machines.

A description is given of the case where the semiconductor deviceincluding the programmable circuit according to one embodiment of thepresent invention is applied to a portable electronic device such as amobile phone, a smartphone, or an e-book reader.

FIG. 10 is a block diagram of a portable electronic device. The portableelectronic device in FIG. 10 includes an RF circuit 421, an analogbaseband circuit 422, a digital baseband circuit 423, a battery 424, apower supply circuit 425, an application processor 426, a flash memory430, a display controller 431, a memory circuit 432, a display 433, atouch sensor 439, an audio circuit 437, a keyboard 438, and the like.The display 433 includes a display portion 434, a source driver 435, anda gate driver 436. The application processor 426 includes a CPU 427, aDSP 428, and an interface 429. For example, when the programmablecircuit described in any of the above embodiments is used for any or allof the RF circuit 421, the analog baseband circuit 422, the memorycircuit 432, the application processor 426, the display controller 431,and the audio circuit 437, power consumption can be reduced.

FIG. 11 is a block diagram of an c-book reader. The e-book readerincludes a battery 451, a power supply circuit 452, a microprocessor453, a flash memory 454, an audio circuit 455, a keyboard 456, a memorycircuit 457, a touch panel 458, a display 459, and a display controller460. The microprocessor 453 includes a CPU 461, a DSP 462, and aninterface 463. For example, when the programmable circuit described inany of the above embodiments is used for any or all of the audio circuit455, the memory circuit 457, the microprocessor 453, and the displaycontroller 460, power consumption can be reduced.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

This application is based on Japanese Patent Applications serial No.2011-121559 filed with Japan Patent Office on May 31, 2011, the entirecontents of which are hereby incorporated by reference.

1. (canceled)
 2. A semiconductor device comprising: a programmablecircuit comprising: a first unit cell; a second unit cell; a bit line; afirst unit cell selection line; a first analog element selection line; afirst input signal line; a first output signal line, a second unit cellselection line; a second analog element selection line; a second inputsignal line; and a second output signal line, wherein: the first unitcell comprises a first transistor, a second transistor, a thirdtransistor, a fourth transistor, and a first analog element, the firstunit cell selection line and a gate electrode of the first transistorare electrically connected to each other, the bit line, one of a sourceelectrode and a drain electrode of the first transistor, and one of asource electrode and a drain electrode of the third transistor areelectrically connected to each other, the first analog element selectionline and a gate electrode of the third transistor are electricallyconnected to each other, the first input signal line, one of a sourceelectrode and a drain electrode of the second transistor, and one ofelectrodes of the first analog element are electrically connected toeach other, the other of the electrodes of the first analog element andone of a source electrode and a drain electrode of the fourth transistorare electrically connected to each other, the first output signal line,the other of the source electrode and the drain electrode of the secondtransistor, and the other of the source electrode and the drainelectrode of the fourth transistor are electrically connected to eachother, the first output signal line and the second input signal line areelectrically connected to each other, the second unit cell comprises afifth transistor, a sixth transistor, and a second analog element, thesecond unit cell selection line and a gate electrode of the fifthtransistor are electrically connected to each other, the bit line, oneof a source electrode and a drain electrode of the fifth transistor, andone of a source electrode and a drain electrode of the sixth transistorare electrically connected to each other, the second analog elementselection line and a gate electrode of the sixth transistor areelectrically connected to each other, the second input signal line andone of electrodes of the second analog element are electricallyconnected to each other, and the other of the electrodes of the secondanalog element and the second output signal line are electricallyconnected to each other.
 3. The semiconductor device according to claim2, wherein at least one of the first transistor and the third transistorcomprises an oxide semiconductor.
 4. The semiconductor device accordingto claim 2, wherein at least one of the fifth transistor and the sixthtransistor comprises an oxide semiconductor.
 5. The semiconductor deviceaccording to claim 2, wherein the first analog element is a resistor. 6.The semiconductor device according to claim 5, wherein the resistorcomprises an oxide semiconductor.
 7. The semiconductor device accordingto claim 2, wherein the first analog element is a capacitor, a coil, ora photoelectric conversion element.
 8. The semiconductor deviceaccording to claim 2, wherein the second analog element is a resistor.9. The semiconductor device according to claim 8, wherein the resistorcomprises an oxide semiconductor.
 10. The semiconductor device accordingto claim 2, wherein the second analog element is a capacitor, a coil, ora photoelectric conversion element.
 11. The semiconductor deviceaccording to claim 2, wherein the other of the source electrode and thedrain electrode of the first transistor and a gate electrode of thesecond transistor are electrically connected to each other to form afirst node, and wherein the other of the source electrode and the drainelectrode of the third transistor and a gate electrode of the fourthtransistor are electrically connected to each other to form a secondnode.
 12. A semiconductor device comprising: a plurality of unitcircuits arranged in a matrix with h rows and n columns, each of unitcircuits comprises; a first unit cell; a second unit cell; a first inputsignal line; a first output signal line, a second input signal line; anda second output signal line, wherein: the first unit cell comprises afirst transistor, a second transistor, a third transistor, a fourthtransistor, and a first analog element, one of a source electrode and adrain electrode of the first transistor, and one of a source electrodeand a drain electrode of the third transistor are electrically connectedto each other, the first input signal line, one of a source electrodeand a drain electrode of the second transistor, and one of electrodes ofthe first analog element are electrically connected to each other, theother of the electrodes of the first analog element and one of a sourceelectrode and a drain electrode of the fourth transistor areelectrically connected to each other, the first output signal line, theother of the source electrode and the drain electrode of the secondtransistor, and the other of the source electrode and the drainelectrode of the fourth transistor are electrically connected to eachother, the first output signal line and the second input signal line areelectrically connected to each other, the second unit cell comprises afifth transistor, a sixth transistor, a seventh transistor, an eighthtransistor, and a second analog element, one of a source electrode and adrain electrode of the fifth transistor, and one of a source electrodeand a drain electrode of the seventh transistor are electricallyconnected to each other, one of a source electrode and a drain electrodeof the sixth transistor, and one of electrodes of the second analogelement are electrically connected to each other, the other of theelectrodes of the second analog element and one of a source electrodeand a drain electrode of the eighth transistor are electricallyconnected to each other, and the other of the source electrode and thedrain electrode of the sixth transistor, and the other of the sourceelectrode and the drain electrode of the eighth transistor areelectrically connected to each other.
 13. The semiconductor deviceaccording to claim 12, wherein at least one of the first transistor andthe third transistor comprises an oxide semiconductor.
 14. Thesemiconductor device according to claim 12, wherein at least one of thefifth transistor and the seventh transistor comprises an oxidesemiconductor.
 15. The semiconductor device according to claim 12,wherein the first analog element is a resistor.
 16. The semiconductordevice according to claim 15, wherein the resistor comprises an oxidesemiconductor.
 17. The semiconductor device according to claim 12,wherein the first analog element is a capacitor, a coil, or aphotoelectric conversion element.
 18. The semiconductor device accordingto claim 12, wherein the second analog element is a resistor.
 19. Thesemiconductor device according to claim 18, wherein the resistorcomprises an oxide semiconductor.
 20. The semiconductor device accordingto claim 12, wherein the second analog element is a capacitor, a coil,or a photoelectric conversion element.
 21. The semiconductor deviceaccording to claim 12, wherein the other of the source electrode and thedrain electrode of the first transistor and a gate electrode of thesecond transistor are electrically connected to each other to form afirst node, and wherein the other of the source electrode and the drainelectrode of the third transistor and a gate electrode of the fourthtransistor are electrically connected to each other to form a secondnode.
 22. The semiconductor device according to claim 12, furthercomprises: a bit line; a first unit cell selection line; and a firstanalog element selection line, wherein: the bit line, the one of thesource electrode and the drain electrode of the first transistor, andthe one of the source electrode and the drain electrode of the fifthtransistor are electrically connected to each other, the first unit cellselection line and a gate electrode of the first transistor areelectrically connected to each other, and the first analog elementselection line and a gate electrode of the third transistor areelectrically connected to each other.
 23. The semiconductor deviceaccording to claim 22, further comprises: a second unit cell selectionline; and a second analog element selection line, the second unit cellselection line and a gate electrode of the fifth transistor areelectrically connected to each other, and the second analog elementselection line and a gate electrode of the seventh transistor areelectrically connected to each other.
 24. The semiconductor deviceaccording to claim 12, wherein the first output signal line iselectrically connected to an third input signal line of a third unitcell which belongs to a same row of the first unit cell and is adjacentto the first unit cell.